Concentric flower reactor
A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second input fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber. An aerosol of catalyst particles may be used to grow the nanowires.
1. A method of fabricating semiconductor nanowires comprising:
providing a first gas stream to a first reaction chamber, wherein the first gas stream comprises a first precursor for fabricating the semiconductor nanowires;
providing a second gas stream to the first reaction chamber, wherein the second gas stream forms a sheath separating the first gas stream from a wall of the first reaction chamber;
providing nanowire growth catalyst particles;
adding a first dopant gas having a first conductivity type to the first gas stream to grow semiconductor nanowires of the first conductivity type in a gas phase in the first reaction chamber; and
adding a second dopant gas having a second conductivity type after the step of adding the first dopant gas to form a p-n or p-i-n junction in the semiconductor nanowires;
wherein the semiconductor nanowires comprise single crystal Group III-V or Group II-VI semiconductor nanowires.
2. The method of claim 1 , wherein the nanowire growth catalyst particles are provided from an aerosol in at least one of the first gas stream or the second gas stream.
3. The method of claim 2 , wherein:
the nanowire growth catalyst particles are provided from an aerosol in the first gas stream; and
the first gas stream containing the catalyst particles flows sequentially through one or more reaction zones of the first reaction chamber such that the semiconductor nanowires grow from the catalyst particles and the semiconductor nanowires grown after passage through the reaction zones are carried by the first gas stream surrounded the second gas stream sheath.
4. The method of claim 3 , wherein the step of adding the second dopant gas comprises adding the second dopant gas to the first gas stream to form the p-n or p-i-n junction in the semiconductor nanowires.
5. The method of claim 3 , further comprising:
removing the second gas stream from the first reaction chamber before it reaches a second reaction chamber;
providing the semiconductor nanowires from the first reaction chamber to the second reaction chamber;
providing a third gas stream to the second reaction chamber, wherein the third gas stream comprises a second precursor for fabricating the semiconductor nanowires; and
providing a fourth gas stream to the second reaction chamber, wherein the fourth gas stream forms a sheath separating the third gas stream from a wall of the second reaction chamber;
wherein the step of adding the second dopant gas comprises providing the second dopant gas to the second reaction chamber to form the p-n or p-i-n junction in the semiconductor nanowires in the gas phase in the second reaction chamber.
6. The method of claim 1 , wherein the semiconductor nanowires comprise the single crystal Group III-V semiconductor nanowires.
7. The method of claim 6 , wherein the first precursor comprises a Group III containing metal organic precursor.
8. The method of claim 7 , further comprising providing a third gas stream to the first reaction chamber, wherein the third gas stream comprises a Group V containing second precursor for fabricating the semiconductor nanowires.
9. The method of claim 8 , wherein the sheath gas comprises nitrogen, hydrogen or a noble gas.
10. The method of claim 9 , wherein the noble gas comprises helium or argon.
11. The method of claim 9 , wherein:
the single crystal Group III-V semiconductor nanowires comprise gallium arsenide nanowires;
the first precursor comprises trimethyl gallium; and
the second precursor comprises AsH 3 .
12. A method of fabricating semiconductor nanowires comprising:
providing a first gas stream to a first reaction chamber, wherein the first gas stream comprises a core flow stream containing a first precursor for fabricating the semiconductor nanowires;
providing a second gas stream to the first reaction chamber, wherein the second gas stream forms a sheath separating the first gas stream from a wall of the first reaction chamber;
providing nanowire growth catalyst particles;
adding a first dopant gas having a first conductivity type to the first gas stream to grow semiconductor nanowires of the first conductivity type in a gas phase in the first reaction chamber;
removing the second gas stream from the first reaction chamber before it reaches a second reaction chamber;
providing the semiconductor nanowires from the first reaction chamber to the second reaction chamber;
providing a third gas stream to the second reaction chamber, wherein the third gas stream comprises a second precursor for fabricating the semiconductor nanowires;
providing a fourth gas stream to the second reaction chamber, wherein the fourth gas stream forms a sheath separating the third gas stream from a wall of the second reaction chamber; and
adding a second dopant gas having a second conductivity type into the second reaction chamber after the step of adding the first dopant gas to grow a p-n or p-i-n junction in the semiconductor nanowires in a gas phase in the second reaction chamber;
wherein the semiconductor nanowires comprise single crystal Group III-V or Group II-VI semiconductor nanowires.
13. The method of claim 11 , wherein the semiconductor nanowires comprise the single crystal Group III-V semiconductor nanowires.
14. The method of claim 13 , wherein the first precursor comprises a Group III containing metal organic precursor.
15. The method of claim 14 , wherein the second precursor comprises a Group V containing precursor.
16. The method of claim 15 , wherein the sheath gas comprises nitrogen, hydrogen or a noble gas.
17. The method of claim 16 , wherein the noble gas comprises helium or argon.
18. The method of claim 16 , wherein:
the single crystal Group III-V semiconductor nanowires comprise gallium arsenide nanowires;
the first precursor comprises trimethyl gallium; and
the second precursor comprises AsH 3 .
19. The method of claim 12 , wherein the nanowire growth catalyst particles are provided from an aerosol in at least one of the first gas stream or the second gas stream.
20. The method of claim 12 , wherein the nanowire growth catalyst particles are provided from an aerosol in the first gas stream.
21. A method of fabricating semiconductor nanowires comprising:
providing nanowire growth catalyst particles to a reaction chamber;
providing a first gas stream to the reaction chamber, wherein the first gas stream comprises a first precursor for fabricating the semiconductor nanowires to grow semiconductor nanowires in a gas phase in the reaction chamber;
providing a second gas stream to the reaction chamber, wherein the second gas stream forms a sheath separating the first gas stream from a wall of the reaction chamber;
adding a first dopant gas having a first conductivity type do dope the semiconductor nanowires with a dopant of the first conductivity type; and
adding a second dopant gas having a second conductivity type after the step of adding the first dopant gas to form a p-n or p-i-n junction in the semiconductor nanowires;
wherein the semiconductor nanowires comprise single crystal Group III-V or Group II-VI semiconductor nanowires.