Method of producing a separator and method of producing a microporous membrane
A method of producing a separator is provided. The method includes providing a particle membrane including inorganic particles on at least one principal surface of a porous body by a vapor-phase process such that the particle membrane has a porosity that is non-uniform in a thickness direction thereof. A method of producing a microporous membrane is also provided.
1. A method for producing a separator, the method comprising:
providing a particle membrane including inorganic particles on at least one principal surface of a porous body by a vapor-phase deposition process, wherein an incidence angle of the vapor-phase deposition process is varied within 0° to 45° such that the particle membrane has a porosity that is non-uniform in a thickness direction thereof, wherein the particle membrane has a thickness of 10 nm or more and less than 100 nm, wherein at least 50% of the inorganic particles have a secondary particle diameter of 20 nm or less, wherein the particle membrane has an oxidation degree that is non-uniform in a thickness direction thereof, the oxidation degree operably controllable by supplying oxygen gas to the principal surface of the porous body during vapor deposition of the particle membrane, and wherein the oxidation degree is highest near an outer surface of the particle membrane and lowest near an interface between the article membrane and the porous body.
2. The method according to claim 1 , wherein the vapor-phase deposition process is selected from the group consisting of a physical vapor deposition process and a chemical vapor deposition process.
3. The method according to claim 2 , wherein the physical vapor deposition process is selected from the group consisting of vacuum deposition, sputtering, ion plating, molecular beam epitaxy, and laser ablation.
4. The method according to claim 2 , wherein the chemical vapor deposition process is selected from the group consisting of metal organic chemical vapor deposition, radio-frequency plasma chemical vapor deposition, optical chemical vapor deposition, laser chemical vapor deposition, and liquid phase epitaxy.
5. The method according to claim 1 , wherein a minimum value of the porosity is about 50% or less.
6. The method according to claim 1 , wherein a minimum value of the porosity is about 40% or less.
7. The method according to claim 1 , wherein the porosity, in the thickness direction of the particle membrane, is highest near an interface between the particle membrane and the porous body.
8. The method according to claim 1 , wherein the porosity, in the thickness direction of the particle membrane, is lowest near an outer surface of the particle membrane.
9. The method according to claim 1 , wherein the porosity, in the thickness direction of the particle membrane, decreases from an interface between the particle membrane and the porous body to an outer surface of the particle membrane.
10. The method according to claim 1 , wherein a density of the inorganic particles, in the thickness direction of the particle membrane, decreases from an outer surface of the particle membrane to an interface between the particle membrane and the porous body.
11. A method for producing a microporous membrane, the method comprising:
providing inorganic particles on at least one principal surface of a porous body by a vapor-phase deposition process, wherein an incidence angle of the vapor-phase deposition process is varied within 0° to 45° such that the microporous membrane has a porosity that is non-uniform in a thickness direction thereof, wherein the microporous membrane has a thickness of 10 nm or more and less than 100 nm, wherein at least 50% of the inorganic particles have a secondary particle diameter of 20 nm or less, wherein the microporous membrane has an oxidation degree that is non-uniform in a thickness direction thereof, the oxidation degree operably controllable by supplying oxygen gas to the principal surface of the porous body during vapor deposition of the microporous membrane, and wherein the oxidation degree is highest near an outer surface of the microporous membrane and lowest near an interface between the microporous membrane and the porous body.
12. The method according to claim 11 , wherein the vapor-phase deposition process is selected from the group consisting of a physical vapor deposition process and a chemical vapor deposition process.
13. The method according to claim 12 , wherein the physical vapor deposition process is selected from the group consisting of vacuum deposition, sputtering, ion plating, molecular beam epitaxy, and laser ablation.
14. The method according to claim 12 , wherein the chemical vapor deposition process is selected from the group consisting of metal organic chemical vapor deposition, radio-frequency plasma chemical vapor deposition, optical chemical vapor deposition, laser chemical vapor deposition, and liquid phase epitaxy.
15. The method according to claim 11 , wherein a minimum value of the porosity is about 50% or less.
16. The method according to claim 11 , wherein a minimum value of the porosity is about 40% or less.
17. The method according to claim 11 , wherein the porosity, in the thickness direction of the microporous membrane, is highest near an interface between the inorganic particles and the porous body.
18. The method according to claim 11 , wherein the porosity, in the thickness direction of the microporous membrane, is lowest near an outer surface of the microporous membrane.
19. The method according to claim 11 , wherein the porosity, in the thickness direction of the microporous membrane, decreases from an interface between the inorganic particles and the porous body to an outer surface of the microporous membrane.
20. The method according to claim 11 , wherein a density of the inorganic particles, in the thickness direction of the microporous membrane, decreases from an outer surface of the microporous membrane to an interface between the inorganic particles and the porous body.