IP Library Granted Patent US 10,407,310
Granted Patent B2
US 10,407,310 · App. 15/416,291 · Granted Sep 10, 2019

System for reducing agglomeration during annealing of flowable, finely divided solids

Inventors: Robert J. Geertsen (Eltopia, WA); Matthew J. Miller (Moses Lake, WA); Justin Johnston (Ellensburg, WA); Stein Julsrud (Moses Lake, WA); Sefa Yilmaz (Moses Lake, WA)
Assignee: REC Silicon Inc
C01B33/037F27D3/0033F27D3/10F27D2003/166
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Quick Facts
Patent No.
US 10,407,310
App. No.
15/416,291
Granted
Sep 10, 2019
Kind
B2
Abstract

This disclosure concerns embodiments of an annealing device and a method for annealing flowable, finely divided solids, such as annealing granular silicon to reduce a hydrogen content of the granular silicon. The annealing device comprises at least one tube through which flowable, finely divided solids are flowed downwardly. The tube includes a heating zone and (i) a residence zone below the heating zone, (ii) a cooling zone below the heating zone, or (iii) a residence zone below the heating zone and a cooling zone below the residence zone. An inert gas is flowed upwardly through the tube. The tube may be constructed from two or more tube segments. The annealing device may include a plurality of tubes arranged and housed within a shell. The annealing device and method are suitable for a continuous process.

Claims (49)

1. A continuous-flow annealing device for annealing flowable, finely-divided solids, the device comprising:

a shell;

one or more tubes arranged within the shell, each tube having an open upper end and an open lower end that is located below the upper end and defining a passageway that extends between the upper end and the lower end, and each tube comprising a heating zone, the heating zone having a lower boundary;

a heat source for heating the heating zones of the one or more tubes;

an inert gas source in fluid communication with the interior of a lower portion of the shell and, thereby, the open lower end of each tube;

a flow-rate controller for controlling a flow rate of inert gas from the inert gas source;

a metering device coupled to a lower portion of the shell; and

at least one baffle within the shell, the baffle defining one or more apertures that are dimensioned and positioned to receive the one or more tubes,

wherein the at least one baffle is positioned at a height corresponding to the lower boundary of the heating zone,

the shell comprises (i) a heating zone inlet at a height above the baffle and (ii) a heating zone outlet at a height above the heating zone inlet, and

the heat source is a source of heated gas and is in fluid communication with the heating zone inlet.

2. The annealing device of claim 1 , wherein the heat source comprises one or more heaters positioned within the shell at a height corresponding to the height of the heating zones of the one or more tubes.

3. The annealing device of claim 1 , wherein the heat source comprises a heating rod positioned within a portion of the passageway of each tube at a height corresponding to the height of the heating zone.

4. The annealing device of claim 1 , wherein each tube further comprises a residence zone located below the heating zone.

5. The annealing device of claim 1 , wherein each tube further comprises a cooling zone located below the heating zone.

6. The annealing device of claim 1 , further comprising a vibrator positioned to vibrate the one or more tubes when the annealing device is in operation.

7. The annealing device of claim 1 , wherein the tubes are constructed of silicon nitride, nitride-bonded silicon carbide, graphite, or a combination thereof.

8. The annealing device of claim 7 , wherein each of the tubes comprises a plurality of abutted tube segments.

9. The annealing device of claim 8 , wherein each tube segment comprises a tubular wall having an annular upper surface and an annular lower surface.

10. The annealing device of claim 1 , wherein the one or more tubes comprises from 2 to 50 tubes.

11. The annealing device of claim 1 , further comprising a receiving system coupled to the metering device, wherein the receiving system is in fluid communication with the interior of the lower portion of the shell when the metering device is operating.

12. The annealing device of claim 11 , wherein the flowable, finely divided solids are granular silicon, and surfaces of the receiving system that contact the annealed granular silicon comprise silicon carbide, silicon nitride, or a combination thereof.

13. The annealing device of claim 1 , further comprising a source of flowable, finely-divided solids coupled to an upper portion of the shell.

14. The annealing device of claim 1 , further comprising a gas outlet that extends through an upper portion of the shell and is in fluid communication with the open upper end of each of the one or more tubes.

15. The annealing device of claim 14 , further comprising a volatile species trap in fluid communication with the gas outlet.

16. The annealing device of claim 1 , wherein the inert gas comprises argon, helium, or hydrogen.

17. A continuous-flow annealing device for annealing flowable, finely-divided solids, the device comprising:

a shell;

one or more tubes arranged within the shell, each tube having an open upper end and an open lower end that is located below the upper end and defining a passageway that extends between the upper end and the lower end, and each tube comprising a heating zone, each tube further comprising a residence zone located below the heating zone and a cooling zone located below the residence zone, wherein the heating zone has a lower boundary, the cooling zone has an upper boundary, and the shell has an upper portion and a lower portion;

a heat source for heating the heating zones of the one or more tubes;

an inert gas source in fluid communication with the interior of a lower portion of the shell and, thereby, the open lower end of each tube;

a flow-rate controller for controlling a flow rate of inert gas from the inert gas source;

a metering device coupled to a lower portion of the shell;

a first baffle positioned within the shell at a height corresponding to the heating zone, the first baffle defining a plurality of apertures that are dimensioned and positioned to receive the plurality of tubes, wherein the first baffle and the upper portion of the shell together define an upper chamber;

a second baffle positioned within the shell at a height below the first baffle and at a height corresponding to the lower boundary of the heating zone, the second baffle defining a plurality of apertures that are dimensioned and positioned to receive the plurality of tubes, wherein the first and second baffles together with the shell define a heating chamber;

a third baffle positioned within the shell at a height corresponding to the upper boundary of the cooling zone, the third baffle defining a plurality of apertures that are dimensioned and positioned to receive the plurality of tubes, wherein the second and third baffles together with the shell define a residence chamber; and

a fourth baffle positioned within the shell at a height below the third baffle, the fourth baffle defining a plurality of apertures that are dimensioned and positioned to receive the plurality of tubes, wherein the third and fourth baffles together with the shell define a cooling chamber, and the fourth baffle and the lower portion of the shell together define a lower chamber.

18. The annealing device of claim 17 , wherein the shell further comprises:

a heating zone inlet located at a height corresponding to the heating chamber;

a heating zone outlet located at a height above the heating zone inlet and at a height corresponding to the heating chamber;

a cooling zone inlet located at a height corresponding to the cooling chamber;

a cooling zone outlet at a height above the cooling zone inlet and at a height corresponding to the cooling chamber.

19. The annealing device of claim 18 , further comprising:

a source of unheated gas in fluid communication with the cooling zone inlet;

a first conduit in fluid communication with the cooling zone outlet and the heating zone inlet, wherein the heat source is a heater positioned to heat a portion of the first conduit;

a second conduit in fluid communication with the heating zone outlet and the cooling zone inlet;

a cooler positioned to cool a portion of the second conduit; and

a blower for circulating a gas through the cooling chamber, the first conduit, the heating chamber, and the second conduit.

20. The annealing device of claim 17 , wherein the inert gas comprises argon, helium, or hydrogen.

Assignments (2)
SECURITY INTEREST Recorded Jan 24, 2025
From: REC SILICON INC; REC ADVANCED SILICON MATERIALS LLC
To: HANWHA INTERNATIONAL LLC, AS LENDER
Reel/Frame 070002/0600 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2017
From: GEERTSEN, ROBERT J.; MILLER, MATTHEW J.; JOHNSON, JUSTIN; JULSRUD, STEIN; YILMAZ, SEFA
To: REC SILICON INC
Reel/Frame 041984/0227 →
Continuity (1)
Related Publication 20180208471A1 · Jul 26, 2018