Photochemical modification of a solid surface
A process for the modification of a solid material, said process comprising contacting a surface of the solid material comprising nucleophilic groups with a hydrosilane in a first step to produce a hydrosilanized surface, and contacting said hydrosilanized surface with at least one alkene and/or alkyne under irradiation with visible and/or ultraviolet light in a second step.
1. A process for the modification of a solid material, said process comprising:
a) contacting an internal surface of a microchannel of the solid material comprising nucleophilic groups with a hydrosilane to produce a hydrosilanized surface, wherein the nucleophilic groups comprise at least one of a hydroxyl group and a silanol group, and the hydrosilanized surface comprises O 3 Si—H groups; and
b) contacting said hydrosilanized surface with at least one alkene and/or alkyne under irradiation with visible and/or ultraviolet light through a mask,
to add a patterned monolayer of the at least one alkene and/or alkyne to the internal surface of the microchannel of the solid material.
2. The process according to claim 1 , wherein the nucleophilic groups are hydroxy, thiol and/or amine groups.
3. The process according to claim 2 , wherein the solid material comprises silicon dioxide.
4. The process according to claim 3 , wherein the solid material comprises glass.
5. The process according to claim 1 , wherein the hydrosilane has the general formula H—Si—X(R 1 )(R 2 ), wherein X is a hydrolysable group, and wherein R 1 and R 2 can be the same as or different to the hydrolysable group X.
6. The process according to claim 5 , wherein X is an alkoxy, acyloxy, halogen or amine group.
7. The process according to claim 5 , wherein the R 1 and/or R 2 group is an organic or organometallic moiety or an inorganic atom or moiety.
8. The process according to claim 1 , wherein the hydrosilane comprises a trialkoxysilane (e.g. H—Si(OC 2 H 5 ) 3 ) and/or trichlorosilane (H—SiCl 3 ).
9. The process according to claim 1 , wherein the silanized surface is contacted with at least one alkene or alkyne under irradiation with ultraviolet light.
10. The process according to claim 9 , wherein the ultraviolet light has a wavelength between 300 nm and 355 nm.
11. The process according to claim 10 , wherein the ultraviolet light has a wavelength between 302 and 330 nm.
12. The process according to claim 1 , wherein the visible and/or ultraviolet light is ultraviolet light.
13. The process according to claim 1 , wherein the solid material is at least partially transparent to the light, and wherein the light is applied from outside an external surface of the microchannel.
14. The process according to claim 1 , wherein the silanized surface is contacted with at least one terminal alkene or alkyne.
15. The process according to claim 1 , wherein the alkene or alkyne is substituted by a functional group.
16. The process according to claim 15 , wherein a protective group is bonded to the functional group.
17. The process according to claim 1 , wherein the visible and/or ultraviolet light passes through an area of the solid material that is located between the mask and the hydrosilanized surface and that is at least partially transparent to the visible and/or ultraviolet light.