IP Library Granted Patent US 10,394,397
Granted Patent B2
US 10,394,397 · App. 15/437,586 · Granted Aug 27, 2019

Manufacturing method of touch sensor film

Inventor: Katsuyuki Nukui (Ashigara-kami-gun, JP)
Assignee: FUJIFILM Corporation
G06F3/044G06F3/041G06F2203/04103G06F2203/04112
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Quick Facts
Patent No.
US 10,394,397
App. No.
15/437,586
Granted
Aug 27, 2019
Kind
B2
Abstract

A touch sensor film preventing moire occurring in accordance with deformation of a support is manufactured by performing roll transportation of an elongated transparent support 1 having a thickness smaller than 80 μm using a plurality of pass rollers 4, 5 , and 6 ; performing annealing treatment with respect to the support 1 at a temperature which is equal to or lower than a temperature obtained by adding 35° C. to a dynamic glass transition temperature of the support 1 ; and forming a mesh pattern formed of thin metal wires 8 a on a surface of the support 1 subjected to the annealing treatment.

Claims (28)

1. A manufacturing method of a touch sensor film comprising:

performing roll transportation of an elongated transparent support having a thickness smaller than 80 m using a plurality of pass rollers;

performing annealing treatment with respect to the support at a temperature which is equal to or lower than a temperature obtained by adding 350 C to a dynamic glass transition temperature of the support; and

forming a mesh pattern formed of thin metal wires on a surface of the support subjected to the annealing treatment,

wherein the support is transported at a temperature equal to or higher than a static glass transition temperature and lower than a dynamic glass transition temperature of the support, after performing the annealing treatment with respect to the support and until the support reaches a first pass roller, and

the temperature of the support is decreased to a temperature lower than the static glass transition temperature while the support reaches a second pass roller from the first pass roller.

2. The manufacturing method of a touch sensor film according to claim 1 ,

wherein an interval between the first pass roller and the second pass roller is within 30 cm.

3. The manufacturing method of a touch sensor film according to claim 2 ,

wherein an interval between the first pass roller and the second pass roller is within 20 cm.

4. The manufacturing method of a touch sensor film according to claim 1 ,

wherein the annealing treatment is performed at a temperature equal to or higher than a temperature obtained by subtracting 10° C. from the dynamic glass transition temperature.

5. The manufacturing method of a touch sensor film according to claim 2 ,

wherein the annealing treatment is performed at a temperature equal to or higher than a temperature obtained by subtracting 10° C. from the dynamic glass transition temperature.

6. The manufacturing method of a touch sensor film according to claim 3 ,

wherein the annealing treatment is performed at a temperature equal to or higher than a temperature obtained by subtracting 10° C. from the dynamic glass transition temperature.

7. The manufacturing method of a touch sensor film according to claim 1 ,

wherein the annealing treatment is performed at a temperature equal to or lower than a temperature obtained by adding 25° C. to the dynamic glass transition temperature.

8. The manufacturing method of a touch sensor film according to claim 2 ,

wherein the annealing treatment is performed at a temperature equal to or lower than a temperature obtained by adding 25° C. to the dynamic glass transition temperature.

9. The manufacturing method of a touch sensor film according to claim 3 ,

wherein the annealing treatment is performed at a temperature equal to or lower than a temperature obtained by adding 25° C. to the dynamic glass transition temperature.

10. The manufacturing method of a touch sensor film according to claim 1 ,

wherein the thickness of the support is smaller than 50 μm.

11. The manufacturing method of a touch sensor film according to claim 2 ,

wherein the thickness of the support is smaller than 50 μm.

12. The manufacturing method of a touch sensor film according to claim 3 ,

wherein the thickness of the support is smaller than 50 μm.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 21, 2017
From: NUKUI, KATSUYUKI
To: FUJIFILM CORPORATION
Reel/Frame 041316/0051 →
Priority Claims (1)
JP 2014-175929 · Aug 29, 2014 · national
Continuity (2)
Continuation PCTJP2015071659 · Jul 30, 2015
Related Publication 20170177118A1 · Jun 22, 2017