Bis-Schiff base compositions and formulations

1. A chemical composition comprising the structure of Formula (I):

wherein:

X consists of a hydrogen;

R is selected from at least one of Formula (IV), Formula (V), Formula (VI), Formula (VII), Formula (VIII), Formula (IX), Formula (X), Formula (XI), Formula (XII), Formula (XIII), Formula (XIV), Formula (XV), Formula (XVI), Formula (XVII), Formula (XVIII), Formula (XIX), Formula (XX), Formula (XXII), Formula (XXIII), Formula (XXIV), Formula (XXV), or Formula (XXVI);

X′ comprises an aromatic moiety, an aliphatic moiety, or a hydrogen when R is selected from Formula (IV), Formula (V), Formula (VI), Formula (VII), Formula (VIII), Formula (XII), Formula (XIII), Formula (XIV), Formula (XV), Formula (XVI), Formula (XVII), Formula (XVIII), Formula (XIX), Formula (XX), Formula (XXII), Formula (XXIII), Formula (XXIV), Formula (XXV), or Formula (XXVI); and

X′ consists of a hydrogen when R is selected from Formula (IX), Formula (X), or Formula (XI):

2. The chemical composition of claim 1 , wherein the chemical composition has a melt viscosity of less than or equal to 100,000 centipoises (cP) at less than or equal to 150° C., as measured by rotation rheometry.

3. The chemical composition of claim 1 , wherein the chemical composition has a melt viscosity of less than or equal to 500 cP at less than or equal to 150° C., as measured by rotational rheometry.

4. The chemical composition of claim 1 , wherein the chemical composition is used in at least one of an architecture, coating, composite, construction, oil and gas, mining, defense, space, aerospace, automotive, marine, or electronic industries.

5. The chemical composition of claim 4 , wherein the chemical composition is used as a thermosetting resin in the composite industry.

6. The chemical composition of claim 4 , wherein the chemical composition is used as a thermosetting resin in the coating industry.

7. A chemical formulation comprising:

at least one solvent; and

a component having the structure of Formula (I):

wherein:

X consists of a hydrogen;

R is selected from at least one of Formula (IV), Formula (V), Formula (VI), Formula (VII), Formula (VIII), Formula (IX), Formula (X), Formula (XI), Formula (XII), Formula (XIII), Formula (XIV), Formula (XV), Formula (XVI), Formula (XVII), Formula (XVIII), Formula (XIX), Formula (XX), Formula (XXII), Formula (XXIII), Formula (XXIV), Formula (XXV), or Formula (XXVI);

X′ comprises an aromatic moiety, an aliphatic moiety, or a hydrogen when R is selected from Formula (IV), Formula (V), Formula (VI), Formula (VII), Formula (VIII), Formula (XII), Formula (XIII), Formula (XIV), Formula (XV), Formula (XVI), Formula (XVII), Formula (XVIII), Formula (XIX), Formula (XX), Formula (XXII), Formula (XXIII), Formula (XXIV), Formula (XXV), or Formula (XXVI); and

X′ consists of a hydrogen when R is selected from Formula (IX), Formula (X), or Formula (XI):

8. The chemical formulation of claim 7 , wherein the solvent is selected from the group consisting of toluene, dichloromethane, chloroform, acetone, tetrahydrofuran, cyclopentanone, parachlorobenzotrifluoride, dibasic ester, N-methylpyrrolidine, and combinations thereof.

9. The chemical formulation of claim 7 , wherein the chemical composition contains from 10 wt % to 90 wt % of the component having the structure of Formula (I).

10. The chemical formulation of claim 8 , wherein the chemical composition contains from 40 wt % to 85 wt % of the component having the structure of Formula (I).

11. The chemical formulation of claim 7 , wherein the formulation is used in at least one of an architecture, coating, construction, oil and gas, mining, defense, space, aerospace, automotive, marine, manufacturing, or electronic industries.