Contamination removal apparatus and method
A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.
1. A substrate dry cleaning system, comprising:
a substrate support; and
a reactive species generator including
a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support,
a first electrode,
a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode,
a first inert wall disposed between the first electrode and the first flow channel, wherein the first inert wall is a cylindrical wall and the first electrode is disposed within the first inert wall with a lead-bismuth eutectic (LBE) metal having 44.5 weight percent lead and 55.5 weight percent bismuth, wherein the LBE has a melting point of 397° K disposed between the first inert wall and the first electrode, and
a second inert wall disposed between the second electrode and the first flow channel.
2. The substrate dry cleaning system of claim 1 , further comprising a carbon dioxide snow generator including a second conduit defining a second flow channel that extends to an outlet of the second conduit, the outlet of the second conduit facing the substrate support, an inner surface of second conduit defining a constriction from a first flow area to a second flow area along a direction of flow toward the outlet of the second conduit, the first flow area being greater than the second flow area.
3. The substrate dry cleaning system of claim 2 , wherein a longitudinal axis of the carbon dioxide snow generator is substantially perpendicular to a surface of the substrate support.
4. The substrate dry cleaning system of claim 2 , wherein a longitudinal axis of the reactive species generator is inclined at a first angle relative to a plane normal to a surface of the substrate support, and
wherein a longitudinal axis of the carbon dioxide snow generator is inclined at a second angle relative to the plane normal to the surface of the substrate support, the first angle being opposite the second angle with respect to the plane normal to the surface of the substrate support.
5. The substrate dry cleaning system of claim 2 , wherein the first flow channel has an annular cross section and the second flow channel is disposed coaxially within the first flow channel.
6. The substrate dry cleaning system of claim 2 , further comprising a controller configured to
selectively admit carbon dioxide from a pressurized carbon dioxide source into the second flow channel, and
selectively admit a gas from a pressurized gas source into the first flow channel.