Superlattice memory having GeTe layer and nitrogen-doped Sb

1. A superlattice memory comprising:

a substrate;

a first electrode provided on the substrate;

a second electrode arranged in opposition to the first electrode;

a superlattice structure part provided between the first electrode and the second electrode, the superlattice structure part including first chalcogen compound layers of a first chalcogen compound, second chalcogen compound layers of a second chalcogen compound the composition of which is different from the first chalcogen compound, and a third chalcogen compound layer of a third chalcogen compound in which N is added to the first chalcogen compound, stacked one on another, and

an amorphous Si seed layer between the first electrode and the superlattice structure part, wherein

each of the first chalcogen compound layers is an Sb 2 Te 3 layer, each of the second chalcogen compound layers is a GeTe layer, and the third chalcogen compound layer is an Sb 2 Te 3 :N layer.

2. The superlattice memory of claim 1 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, and the third chalcogen compound layer is provided between each of the first chalcogen compound layers and each of the second chalcogen compound layers.

3. The superlattice memory of claim 1 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, and the third chalcogen compound layer is interposed to the central part in the thickness direction of each of the first chalcogen compound layers.

4. The superlattice memory of claim 1 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, the uppermost layer is the second chalcogen compound layer, and the third chalcogen compound layer is provided between the second chalcogen compound layer of the uppermost layer and the second electrode.

5. The superlattice memory of claim 1 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, the uppermost layer of the superlattice structure part is the first chalcogen compound layer, and the third chalcogen compound layer is provided between the first chalcogen compound layer of the uppermost layer and the second electrode.

6. The superlattice memory of claim 1 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, the uppermost layer of the superlattice structure part is the first chalcogen compound layer, and the third chalcogen compound layer is provided between the first chalcogen compound layer of the uppermost layer and the second chalcogen compound layer adjacent to the uppermost first chalcogen compound layer.

7. The superlattice memory of claim 1 , wherein the superlattice structure part is provided in a pillared shape.

8. The superlattice memory of claim 1 , further comprising a selector device between the first electrode and the superlattice structure part.

9. The superlattice memory of claim 8 , wherein the selector device is an ovonic device or a diode device.

10. A memory device comprising:

a plurality of first lines arranged in parallel with each other;

a plurality of second lines arranged in parallel with each other in such a manner that the second lines intersect the first lines;

superlattice memory cells arranged at intersection parts at which the first lines and the second lines intersect each other, the superlattice memory cells including first chalcogen compound layers of a first chalcogen compound, second chalcogen compound layers of a second chalcogen compound the composition of which is different from the first chalcogen compound, and a third chalcogen compound layer of a third chalcogen compound in which N is added to the first chalcogen compound, stacked one on another;

selector elements provided between the first lines or the second lines and the superlattice memory cells; and

an amorphous Si seed layer between the lowermost layer of the superlattice memory cell and the first lines or the second lines, wherein

each of the first chalcogen compound layers is an Sb 2 Te 3 layer, each of the second chalcogen compound layers is a GeTe layer, and the third chalcogen compound layer is an Sb 2 Te 3 :N layer.

11. The memory device of claim 10 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, and the third chalcogen compound layer is provided between each of the first chalcogen compound layers and each of the second chalcogen compound layers.

12. The memory device of claim 10 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, and the third chalcogen compound layer is interposed to the central part in the thickness direction of each of the first chalcogen compound layers.

13. The memory device of claim 10 , wherein the first chalcogen compound layers and the second chalcogen compound layers are alternately stacked, the uppermost layer is the second chalcogen compound layer, and the third chalcogen compound layer is provided between the second chalcogen compound layer of the uppermost layer and the second electrode.

14. The memory device of claim 10 , wherein each of the selector elements is an ovonic element or a diode element.

15. The memory device of claim 10 , wherein the first chalcogen compound layers, the second chalcogen compound layers, and the third chalcogen compound layer are provided in a pillared shape.

16. The memory device of claim 10 , wherein the first chalcogen compound layers, the second chalcogen compound layers, and the third chalcogen compound layer are provided to be consecutive over a plurality of superlattice memory cells.