Alkali-free glass substrate and method for manufacturing alkali-free glass substrate
The present invention relates to an alkali-free glass substrate, in which when two arbitrary sites in one main surface thereof are selected, an absolute value of a difference between a thermal shrinkage ratio in an arbitrary direction at one site and a thermal shrinkage ratio in a direction orthogonal to the arbitrary direction at another site is 2 ppm or less, provided that the thermal shrinkage ratio is calculated by measuring a deformation amount in a measuring direction of the glass substrate between before and after a heat treatment of raising a temperature from normal temperature to 600° C. at 100° C./hour, holding the glass substrate at 600° C. for 80 minutes, and lowering the temperature from 600° C. to normal temperature at 100° C./hour.
1. An alkali-free glass substrate comprising:
a main surface with a first site and a second site,
wherein an anisotropic variation of the alkali-free glass substrate is 2 ppm or less, wherein the anisotropic variation is an absolute value of a difference between a first thermal shrinkage ratio in an arbitrary direction from the first site and a second thermal shrinkage ratio in a direction orthogonal to the arbitrary direction from the second site,
wherein the first thermal shrinkage ratio and the second thermal shrinkage ratio are calculated by measuring a deformation amount in a measuring direction of the glass substrate between, before, and after a heat treatment of:
raising a temperature from normal temperature to 600° C. at 100° C./hour,
holding the glass substrate at 600° C. for 80 minutes, and
lowering the temperature from 600° C. to normal temperature at 100° C./hour.
2. The alkali-free glass substrate according to claim 1 , wherein a first absolute value of the first thermal shrinkage ratio in the arbitrary direction from the first site and a second absolute value of the second thermal shrinkage ratio in the direction orthogonal to the arbitrary direction from the second site are 100 ppm or less.
3. The alkali-free glass substrate according to claim 2 , wherein the first absolute value and the second absolute value are 70 ppm or less.
4. The alkali-free glass substrate according to claim 3 , wherein the first absolute value and the second absolute value are 50 ppm or less.
5. The alkali-free glass substrate according to claim 1 , which wherein the alkali-free glass substrate has a strain point of 630° C. or more.
6. The alkali-free glass substrate according to claim 5 , wherein the strain point is 680° C. or more.
7. The alkali-free glass substrate according to claim 6 , wherein the strain point is 700° C. or more.
8. The alkali-free glass substrate according to claim 1 , wherein the alkali-free glass substrate has a substrate size of (1,450 mm×1,450 mm) or more.
9. The alkali-free glass substrate according to claim 8 , wherein the substrate size is (3,000 mm×2,800 mm) or more.
10. The alkali-free glass substrate according to claim 1 , wherein the alkali-free glass substrate has a thickness of 0.5 mm or less.
11. The alkali-free glass substrate according to claim 1 , further comprising an alkali-free glass comprising, in terms of mass % on the basis of oxides,
SiO 2 : from 54 to 68%,
Al 2 O 3 : from 10 to 23%,
B 2 O 3 : from 0 to 12%,
MgO: from 0 to 12%,
CaO: from 0 to 15%,
SrO: from 0 to 16%, and
BaO: from 0 to 15%,
provided that MgO+CaO+SrO+BaO: from 8 to 26%.
12. The alkali-free glass substrate according to claim 11 , wherein the content of B 2 O 3 is 5% or less in terms of mass % on the basis of oxides.
13. The alkali-free glass substrate according to claim 1 , wherein the alkali-free glass substrate has a thickness deviation of 20 μm or less.