Charged particle beam apparatus
A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.
1. A charged particle beam apparatus which automatically prepares a sample piece from a sample, the charged particle beam apparatus comprising:
a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam;
a sample stage configured to move, the sample being placed on the sample stage;
a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample;
a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and
a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.
2. The charged particle beam apparatus according to claim 1 , wherein
the sample piece relocation unit includes a needle configured to hold and transport the sample piece which is separated and picked up from the sample, and a needle drive mechanism configured to drive the needle, and
the computer controls the needle drive mechanism to control a position of the needle which is the target object in relation to the sample piece.
3. The charged particle beam apparatus according to claim 2 , further comprising:
a gas supply unit configured to irradiate a gas for forming a deposition film using the irradiation of the charged particle beam,
wherein the computer controls the charged particle beam irradiation optical system, the needle drive mechanism, and the gas supply unit to cause the needle to approach the sample piece leaving a gap between the needle and the sample piece, and to connect the needle to the sample piece through the deposition film.
4. The charged particle beam apparatus according to claim 3 , wherein a gap between the needle and the sample piece in which the deposition film is formed is less than or equal to 1 μm.
5. The charged particle beam apparatus according to claim 4 , wherein the gap between the needle and the sample piece in which the deposition film is formed is 100 nm to 400 nm.
6. The charged particle beam apparatus according to claim 2 , wherein
the computer controls the needle drive mechanism to cause the needle to approach the sample piece using a template and tip coordinates,
the template is formed using an absorption current image which is obtained by irradiating the needle with the charged particle beam, and
the tip coordinates of the needle are acquired from the absorption current image which is obtained by irradiating the needle with the charged particle beam.
7. The charged particle beam apparatus according to claim 1 , wherein
the sample piece relocation unit is provided with a needle configured to hold and transport the sample piece which is separated and picked up from the sample, and a needle drive mechanism configured to drive the needle,
the sample piece holder includes a columnar portion to which the sample piece is relocated, and
the computer controls the needle drive mechanism to control a position of the sample piece in relation to the columnar portion which is the target object.