IP Library Granted Patent US 9,934,940
Granted Patent B2
US 9,934,940 · App. 15/468,657 · Granted Apr 3, 2018

Control device, charged particle beam apparatus, program and method for producing processed product

Inventors: Satoshi Tomimatsu (Tokyo, JP); Tsuyoshi Oonishi (Tokyo, JP); Hiroki Kawada (Tokyo, JP); Hideo Sakai (Tokyo, JP)
Assignee: Hitachi High-Tech Science Corporation
H01J37/3026H01J37/3171
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,934,940
App. No.
15/468,657
Granted
Apr 3, 2018
Kind
B2
Abstract

There is provided a control device for controlling a charged particle beam apparatus, wherein the beam apparatus comprises a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit, and the control device comprises an angle calculation unit that based on a direction of a first processing in which a processed surface having a normal line not parallel to any of the turning axes is generated in the workpiece by the irradiation unit and a direction of a second processing to be processed by the irradiation unit from a direction different from the direction of the first processing with respect to the processed surface to be generated by the first processing, calculates turning angles about the turning axes that changes the direction of the stage from the direction of the first processing to the direction of the second processing.

Claims (19)

1. A control device for controlling a charged particle beam apparatus, the charged particle beam apparatus comprising a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit for processing a workpiece on the workpiece stage by irradiating a charged particle beam from a predetermined direction, the control device comprising:

an angle calculation unit that based on a direction of a first processing in which a processed surface having a normal line not parallel to any of the turning axes is generated in the workpiece by the irradiation unit and a direction of a second processing to be processed by the irradiation unit from a direction different from the direction of the first processing with respect to the processed surface to be generated by the first processing, calculates turning angles about the turning axes that change the direction of the workpiece stage from the direction of the first processing to the direction of the second processing.

2. The control device for controlling a charged particle beam apparatus according to claim 1 , wherein

the turning axes include two axes orthogonal to each other at an irradiation position where the charged particle beam of the workpiece stage is irradiated, and

the angle calculation unit calculates a turning angle about axis for each of the two axes as the turning angles about the turning axes.

3. The control device for controlling a charged particle beam apparatus according to claim 2 , wherein

the turning axes are provided with a tilt axis which passes through an irradiation position to be irradiated with the charged particle beam of the workpiece stage and is orthogonal to a direction in which the charged particle beam is irradiated, and a rotation axis which passes through the irradiation position and is orthogonal to the tilt axis, and wherein

the angle calculation unit calculates a turning angle about the tilt axis and a turning angle about the rotation axis as the turning angles about the turning axes.

4. The control device for controlling a charged particle beam apparatus according to claim 3 , wherein

the angle calculation unit calculates a third angle that is the turning angle about the tilt axis as the turning angles about the turning axes, based on a first angle formed by an irradiation axis of the charged particle beam and the rotation axis in the first processing and a second angle indicating a difference between the direction of the first processing and the direction of the second processing.

5. The control device for controlling a charged particle beam apparatus according to claim 4 , wherein

the angle calculation unit calculates a fourth angle that is a turning angle about the rotation axis as the turning angles about the turning axes, based on the first angle and the third angle.

6. A charged particle beam apparatus comprising the control device according to claim 1 .

7. A program to be executed in a computer for controlling a charged particle beam apparatus, the charged particle beam apparatus comprising a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit for processing a workpiece on the workpiece stage by irradiating a charged particle beam from a predetermined direction, the program configured to execute:

a first processing step of generating a processed surface having a normal line not parallel to any of the turning axes in the workpiece, by processing from a first direction, and

a second processing step of processing the processed surface generated in the first processing step from a second direction different in direction from the first direction, by rotating the workpiece stage about the turning axis.

8. A method of producing a processed product by a charged particle beam apparatus, the charged particle beam apparatus comprising a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit for processing a workpiece on the workpiece stage by irradiating a charged particle beam from a predetermined direction, the apparatus configured to perform:

a first processing step of generating a processed surface having a normal line not parallel to any of the turning axes in the workpiece, by processing from a first direction, and

a second processing step of processing the processed surface generated in the first processing step from a second direction different in direction from the first direction, by rotating the workpiece stage about the turning axis.

Assignments (3)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0555 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0648 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 24, 2017
From: TOMIMATSU, SATOSHI; OONISHI, TSUYOSHI; KAWADA, HIROKI; SAKAI, HIDEO
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 041728/0574 →
Priority Claims (1)
JP 2016-062280 · Mar 25, 2016 · national
Continuity (1)
Related Publication 20170278673A1 · Sep 28, 2017