IP Library Granted Patent US 10,014,467
Granted Patent B2
US 10,014,467 · App. 15/478,309 · Granted Jul 3, 2018

Semiconductor memory device

Inventor: Daisaburo Takashima (Yokohama, JP)
Assignee: TOSHIBA MEMORY CORPORATION
H01L45/1233H01L27/24H01L27/249H01L27/2409H01L27/2427H01L45/065H01L45/085H01L45/12H01L45/122H01L45/1253H01L45/14H01L45/141H01L45/144H01L45/146
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,014,467
App. No.
15/478,309
Granted
Jul 3, 2018
Kind
B2
Abstract

According to one embodiment, a semiconductor memory device includes a plurality of first resistance-change memory elements of a two-terminal type, a second resistance-change memory element of a two-terminal type, a rectifier element of a two-terminal type, a local bit line connected to ends of the first resistance-change memory elements, an end of the second resistance-change memory element and an end of the rectifier element, and a global bit line connected to the other end of the second resistance-change memory element.

Claims (22)

1. A semiconductor memory device comprising:

a plurality of first resistance-change memory elements of a two-terminal type;

a second resistance-change memory element of a two-terminal type;

a rectifier element of a two-terminal type;

a local bit line connected to ends of the first resistance-change memory elements, an end of the second resistance-change memory element and an end of the rectifier element; and

a global bit line connected to the other end of the second resistance-change memory element.

2. The device of claim 1 , wherein

the second resistance-change memory element is set to a high-resistance state by supplying a high-resistance-state setting signal between the other end of the rectifier element and the global bit line, and the second resistance-change memory element is set to a low-resistance state having a resistance lower than that in the high-resistance state by supplying a low-resistance-state setting signal between the other end of the rectifier element and the global bit line, and

data is written and read for a desired one of the first resistance-change memory elements connected to the second resistance-change memory element set to the low-resistance state.

3. The device of claim 2 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the rectifier element are stacked vertically.

4. The device of claim 3 , wherein

the first resistance-change memory elements and the second resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

5. The device of claim 2 , wherein

the first resistance-change memory elements and the second resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

6. The device of claim 1 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the rectifier element are stacked vertically.

7. The device of claim 6 , wherein

the first resistance-change memory elements and the second resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

8. The device of claim 1 , wherein

the first resistance-change memory elements and the second resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

9. The device of claim 1 , wherein the rectifier element comprises a diode.

Assignments (4)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043620/0798 →
Continuity (3)
Division 14838535 · Aug 28, 2015
Provisional Application 62132156 · Mar 12, 2015
Related Publication 20170207272A1 · Jul 20, 2017