IP Library Granted Patent US 10,468,241
Granted Patent B2
US 10,468,241 · App. 15/479,231 · Granted Nov 5, 2019

Monolithic collimator and energy analyzer for ion spectrometry

Inventors: Earl Scime (Morgantown, WV); Amy M. Keesee (Bridgeport, WV); Matthew Phillip Dugas (North Oaks, MN); Steven Brian Ellison (Woodbury, MN); Joseph Christopher David Tersteeg (Columbia Heights, MN); Drew B. Elliott (Morgantown, WV)
Assignee: West Virginia University
H01J49/48H01J49/06
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Quick Facts
Patent No.
US 10,468,241
App. No.
15/479,231
Granted
Nov 5, 2019
Kind
B2
Abstract

Disclosed are various examples related to ion or particle spectrometry utilizing a monolithic collimator and energy analyzer. In one example, a particle selection device includes a single substrate including a curved channel energy analyzer section and a straight channel collimator section, wherein particles pass through the collimator section and enter the energy analyzer section of the substrate. The channel outlets in the collimator section are aligned with the channel inlets of the energy analyzer section. Electric and/or magnetic fields can be applied across the channels of the energy analyzer for ion or particle discrimination. A particle detector at the outlet of the energy analyzer section can provide indications of detected ions and/or particles.

Claims (19)

1. A particle selection device, comprising:

a single substrate including a curved channel energy analyzer section and a straight channel collimator section, wherein particles pass through the straight channel collimator section and enter the curved channel energy analyzer section of the substrate.

2. The particle selection device of claim 1 , wherein the particle selection device passes a selected particle through both the curved channel energy analyzer section and the straight channel collimator section to a particle detector.

3. The particle selection device of claim 1 , wherein the particle selection device is made on a wafer.

4. The particle selection device of claim 3 , wherein the wafer is a silicon wafer.

5. The particle selection device of claim 3 , wherein the particle selection device is made on the wafer using MEMs process techniques.

6. The particle selection device of claim 1 , wherein the curved channel energy analyzer section is configured to apply a transverse electric field.

7. The device of claim 6 , wherein channels of the particle selection device are closed with a secondary substrate configured to apply voltages across the channels.

8. The particle selection device of claim 1 , wherein the curved channel energy analyzer section is configured to apply a transverse magnetic field.

9. The particle selection device of claim 8 , wherein channels of the particle selection device are closed with a secondary substrate configured to apply magnetic fields to walls of the channels.

10. The particle selection device of claim 9 , wherein the magnetic fields are applied through an external coil.

11. The particle selection device of claim 9 wherein the secondary substrate is a permanent magnet substrate.

12. The particle selection device of claim 8 , wherein the particle selection device is configured to apply magnetic fields through an external coil and the secondary substrate is constructed of a soft magnetic material.

13. The particle selection device of claim 8 , wherein the secondary substrate comprises a resistive network where a device electrode adjacent to energy bands is configured to bias the channels within the energy band.

14. The particle selection device of claim 1 , comprising a plurality of stacked single substrates, each single substrate of the plurality of stacked single substrates comprising at least one straight channel collimator section and at least one curved channel energy analyzer section.

15. The particle selection device of claim 1 , comprising a plurality of single substrates that are stacked.

16. The particle selection device of claim 15 , wherein the plurality of single substrates are connected with through substrate vias (TSVs).

17. The device of claim 1 , wherein channels of the particle selection device are closed with a secondary substrate configured to apply voltages across the channels.

18. The particle selection device of claim 1 , wherein channels of the particle selection device are closed with a secondary substrate configured to apply magnetic fields to walls of the channels.

Assignments (3)
CONFIRMATORY LICENSE Recorded May 5, 2020
From: WEST VIRGINIA UNIVERSITY
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 052578/0973 →
CORRECTIVE ASSIGNMENT TO ADD THE OMITTED SIXTH ASSIGNOR'S DATA PREVIOUSLY RECORDED ON REEL 042238 FRAME 0888. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded May 5, 2017
From: SCIME, EARL; KEESEE, AMY M.; DUGAS, MATTHEW PHILLIP; ELLISON, STEVEN BRIAN; TERSTEEG, JOSEPH CHRISTOPHER DAVID; ELLIOTT, DREW B.
To: WEST VIRGINIA UNIVERSITY
Reel/Frame 042410/0103 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 4, 2017
From: SCIME, EARL; KEESEE, AMY M.; DUGAS, MATTHEW PHILLIP; ELLISON, STEVEN BRIAN; TERSTEEG, JOSEPH CHRISTOPHER DAVID
To: WEST VIRGINIA UNIVERSITY
Reel/Frame 042238/0888 →
Continuity (2)
Provisional Application 62317918 · Apr 4, 2016
Related Publication 20170287693A1 · Oct 5, 2017