IP Library Granted Patent US 10,446,798
Granted Patent B2
US 10,446,798 · App. 15/500,298 · Granted Oct 15, 2019

Top-emitting WOLED display device

Inventors: Xianjie Li (Guangdong, CN); Qiming Peng (Guangdong, CN)
Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
H01L51/5275H01L27/32H01L27/322H01L27/3211H01L27/3244H01L51/50H01L51/5016H01L51/52H01L51/5237H01L51/5271H01L51/5218
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Quick Facts
Patent No.
US 10,446,798
App. No.
15/500,298
Granted
Oct 15, 2019
Kind
B2
Abstract

Disclosed is a top-emitting WOLED display device. An optical turning layer with a uniform thickness is added between anode layers of three sub-pixels R, G and B and a reflective metal layer of the display device. Because of arrangement of the optical turning layer, a distance between a WOLED layer and a reflective metal layer is increased. Thus, a total cavity length of a white OLED is increased, and a microcavity effect of a top-emitting WOLED is overcome. The optical turning layer is suitable for manufacture of AMOLED display devices with high-resolution and color gamut.

Claims (20)

1. A top-emitting WOLED display device, comprising: a reflective metal layer, anode layer of three sub-pixels R, G, and B, and an optical turning layer between the anode layers of three sub-pixels R, G, and B and the reflective metal layer, wherein the anode layers of the three sub-pixels R, G, and B have a same thickness, and wherein the optical turning layer has a same thickness throughout each of the anode layers of the three sub-pixels R, G, and B.

2. The top-emitting WOLED display device according to claim 1 , wherein the optical turning layer comprises two or more transparent films superimposed on each other.

3. The top-emitting WOLED display device according to claim 1 , wherein the optical turning layer is made of a transparent material having a refractive index n >1.7.

4. The top-emitting WOLED display device according to claim 2 , further comprising an oxide insert layer between each of the two or more transparent films superimposed on each other.

5. The top-emitting WOLED display device according to claim 1 , wherein the optical turning layer has a thickness in a range from 100 nm to 500 nm.

6. The top-emitting WOLED display device according to claim 2 , wherein the transparent films are ITO thin films, IZO thin films, or AZO thin films.

7. The top-emitting WOLED display device according to claim 1 , wherein the reflective metal layer is made of aluminum, an aluminum alloy, silver, or a silver alloy.

8. The top-emitting WOLED display device according to claim 1 , further comprising a TFT array substrate, a WOLED layer, an encapsulant resin material layer, a color filter, a sealant frame, and a cover glass,

wherein the reflective metal layer is formed on the TFT array substrate; the optical turning layer is formed on the reflective metal layer; the WOLED layer is formed on the optical turning layer the eneapsulant resin material layer is formed on the WOLED layer; the cover glass is arranged above the encapsulant resin material; the color filter is fitted inside the cover glass; and the cover glass and the TFT array substrate are fixed by the sealant frame.

9. The top-emitting WOLED display device according to claim 2 , further comprising a TFT array substrate, a WOLED layer, an encapsulant resin material layer, a color filter, a sealant frame, and a cover glass,

wherein the reflective metal layer is formed on the TFT array substrate; the optical turning layer is formed on the reflective metal layer; the WOLED layer is formed on the optical turning layer the encapsulant resin material layer is formed on the WOLED layer; the cover glass is arranged above the encapsulant resin material; the color filter is fitted inside the cover glass; and the cover glass and the TFT array substrate are fixed by the sealant frame.

10. The top-emitting WOLED display device according to claim 3 , further comprising a TFT array substrate, a WOLED layer, an eneapsulant resin material layer, a color filter, a sealant frame, and a cover glass,

wherein the reflective metal layer is formed on the TFT array substrate; the optical turning layer is formed on the reflective metal layer; the WOLED layer is formed on the optical turning layer the encapsulant resin material layer is formed on the WOLED layer; the cover glass is arranged above the eneapsulant resin material; the color filter is fitted inside the cover glass; and the cover glass and the TFT array substrate are fixed by the sealant frame.

11. The top-emitting WOLED display device according to claim 8 , wherein the WOLED layer comprises an anode layer, a light emitting unit, and a semi-transparent cathode layer,

wherein the semi-transparent cathode layer is formed on a light emitting layer, and the light emitting unit is formed on the anode laver.

12. The top-emitting WOLED display device according to claim 11 , wherein the semi-transparent cathode layer is made of a low work function metal material.

13. The top-emitting WOLED display device according to claim 11 , wherein the light emitting unit comprises a function layer, a light emitting layer, and a connection layer.

14. The top-emitting WOLED display device according to claim 13 , wherein the light emitting layers are of multiple colors.

15. The top-emitting WOLED display device according to claim 13 , wherein the function layer is a combination of a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer.

16. The top-emitting WOLED display device according to claim 12 , wherein the semi-transparent cathode layer has a thickness in a range from 10 nm to 30nm.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2017
From: LI, XIANJIE; PENG, QIMING
To: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
Reel/Frame 044286/0951 →
Priority Claims (1)
CN 2016 1 0685005 · Aug 18, 2016 · national
Continuity (1)
Related Publication 20190006627A1 · Jan 3, 2019