Anti-Reflective Treatment Of The Rear Side Of A Semiconductor Wafer
A method for producing a semiconductor wafer, in which an optical anti-reflective layer ( 4 ) is formed on the backside of the wafer in order to optimize optical access ( 17 ) to or from CMOS devices ( 10 ) through the backside ( 3 2 ) of the wafer ( 1 ). The CMOS devices ( 10 ) are produced only after formation of an anti-reflective layer ( 4 ), the etching stop layers ( 5, 6 ) formed thereon, the bonding layer ( 7 ) and the carrier wafer ( 8 ) bonded thereto. After formation of the CMOS devices, the etching stop layers ( 5, 6 ), the bonding layer ( 7 ) and the bonded carrier wafer ( 8 ) are thinned and removed, at least selectively, by grinding or by means of lithography ( 16 ) or masked etching.
1 . A method for producing a semiconductor device, the method comprising the following steps:
a production step wherein a plurality of circuit components ( 10 ) are produced on a face ( 22 ) of a base wafer ( 1 ′) and the circuit components ( 10 ) comprise at least one photosensitive or photogenic optoelectronic component ( 10 );
a first anti-reflection step wherein at least one dielectric anti-reflective layer ( 4 , 5 ′) is created on a backside ( 31 ) of the base wafer ( 1 ′);
wherein the first anti-reflection step is performed prior to the production step.
2 . The method according to claim 1 , further comprising at least one coating step, in which at least one further layer ( 5 , 6 , 7 ) is created on or applied to the anti-reflective layer ( 4 ), wherein the at least one further layer comprises a second anti-reflective layer ( 5 ′) or at least one etching stop layer, and wherein the at least one coating step is performed subsequent to the anti-reflection step and prior to the production step.
3 . The method according to claim 2 , further comprising at least one first application of a first carrier wafer ( 8 ) to the backside ( 31 ) of the base wafer ( 1 ), wherein the first application of the first carrier wafer ( 8 ) is performed subsequent to the anti-reflection step and prior to the production step.
4 . The method according to claim 3 , wherein the at least one further layer ( 5 , 6 , 7 ) comprises a bonding layer ( 7 ), and wherein the application of the first carrier wafer ( 8 ) includes bonding the first carrier wafer ( 8 ) to the bonding layer ( 7 ).
5 . The method according to claim 4 , further comprising at least one thinning step performed subsequent to the production step, wherein a thickness of the applied first carrier wafer ( 8 ) is reduced.
6 . The method according to claim 5 , wherein the thinning step comprises a substantially uniform or complete removal of the first carrier wafer ( 8 ) from the backside ( 32 ) of the base wafer ( 1 ′).
7 . The method according to claim 1 , further comprising a second application of a second carrier wafer ( 18 ) to the face ( 23 ) of the base wafer ( 1 ′), wherein the second application is performed subsequent to the production step and prior to the thinning step.
8 . The method according to claim 7 , wherein the second carrier wafer ( 18 ) is removed, at least in part, subsequent to the thinning step.
9 . The method according to claim 1 , further comprising a selective removal of material of the at least one further layer ( 5 , 6 , 7 ) or of the thinned first carrier wafer ( 8 ) in at least one selected location ( 17 ) on the backside ( 32 ) of the base wafer ( 1 ′), wherein the at least one selected location ( 17 ) on the backside ( 32 ) is located opposite to the at least one optoelectronic component ( 10 ) formed on the face ( 22 ) of the base wafer.
10 . The method according to claim 9 , wherein the selective removal comprises a masked method or a lithographic method.
11 . The method according to claim 9 , wherein tapered light windows ( 16 ) are opened through the at least one further layer ( 5 , 6 , 7 ) or through the thinned first carrier wafer ( 8 ) up to the at least one selected location ( 17 ) of the anti-reflective layer ( 4 , 5 ′).
12 . The method according to claim 1 , wherein the production step includes a CMOS method, and the circuit components ( 10 ) comprise CMOS devices.
13 . The method according to claim 1 , wherein the anti-reflective layer ( 4 , 5 ′) includes an Si 3 N 4 layer having a thickness of 10 nm to 60 nm.
14 . The method according to claim 1 , wherein the second anti-reflective layer ( 4 , 5 ′) includes an oxide layer ( 5 ′) having a thickness of 1 nm to 5 nm.
15 . (canceled)
16 . A method of producing a semiconductor device, the method comprising the following steps:
providing a base wafer having a face side and a backside; and comprising
a first anti-reflection providing step comprising creating at least one dielectric anti-reflective layer on the backside of the base wafer; and
a production step comprising producing a plurality of circuit components on the face of the base wafer, wherein the circuit components comprise at least one photosensitive optoelectronic component.
17 . A method of producing a semiconductor device, the method comprising the following steps:
providing a base wafer having a face side and a backside;
and comprising
a first anti-reflection providing step comprising creating at least one dielectric anti-reflective layer on the backside of the base wafer;
a production step comprising producing a plurality of circuit components on the face of the base wafer, wherein the circuit components comprise at least one photogenic optoelectronic component.