Anti-glare substrates with a uniform textured surface and low sparkle and methods of making the same
Embodiments of an anti-glare article and methods for forming the same are disclosed. In one or more embodiments, the anti-glare article includes a substrate having a surface, and a plurality of features disposed on the surface, wherein about 50% or more of the plurality of features comprise a normalized area in the range from about 0.5 to about 1.5, and the normalized area is defined as the relationship (surface area of a feature/average surface area of all features). In some embodiments, about 90% or more of the features have a surface area of about 100 micrometers or less. The anti-glare article exhibits a PPDr of about 5% or less, a transmission haze of less than about 20% and a DOI of less than about 90%. Methods of forming the substrate are also disclosed and include etching a surface of a substrate with an etchant comprising a water soluble metal ion salt.
1. An anti-glare article comprising:
a substrate having a surface;
a plurality of features disposed on the surface,
wherein 50% or more of the plurality of features comprise a normalized area in the range from 0.5 to 1.5, wherein the normalized area is defined as the relationship of a surface area of a feature divided by an average surface area of all features, and wherein 90% or more of the plurality of features have a surface area of 100 μm 2 or less.
2. The anti-glare article of claim 1 , wherein the article exhibits a PPDr of 5% or less, wherein the PPDr is a low pixel power deviation reference.
3. The anti-glare article of claim 2 , wherein the article exhibits a transmission haze of less than 20%.
4. The anti-glare article of claim 2 , wherein the substrate surface exhibits a gloss at 60° of 87% or less.
5. The anti-glare article of claim 1 , wherein the article exhibits a transmission haze of greater than or equal to 6.7% to less than or equal to 17.5%.
6. The anti-glare article of claim 1 , wherein the substrate surface exhibits a gloss at 60° of greater than or equal to 62% to less than or equal to 86.6%.
7. The anti-glare article of claim 1 , wherein the substrate surface exhibits a gloss at 85° of greater than or equal to 60% to less than or equal to 77.3%.
8. The anti-glare article of claim 1 , wherein the substrate surface exhibits a gloss at 20° of greater than or equal to 37.3% to less than or equal to 63%.
9. A method of forming a substrate with an anti-glare surface comprising
etching a portion of a first surface of a substrate with an etchant to provide an etched surface, the etchant comprising a water soluble metal ion salt; and
removing a portion of the etched surface to provide the anti-glare surface,
wherein the anti-glare surface comprises a plurality of features, and
wherein 50% or more of the plurality of features comprise a normalized area in the range from 0.5 to 1.5, the normalized area is defined as the relationship of a surface area of a feature divided by an average surface area of all features, and wherein 90% or more of the plurality of features have a surface area of 100 μm 2 or less.
10. The method of claim 9 , wherein the water soluble metal ion salt comprises any one or more of CuCl 2 , Cu(NO 3 ) 2 , CuSO 4 , FeCl 3 , Fe 2 (SO 4 ) 3 , Fe(NO 3 ) 3 , CoCl 2 , Co 2 SO 4 , Co(NO 3 ) 2 , NiCl 2 , Ni 2 SO 4 , Ni(NO 3 ) 2 , ZnCl 2 , Zn 2 SO 4 , Zn(NO 3 ) 2 , CaCl 2 ), Ca 2 SO 4 , Ca(NO 3 ) 2 , MgCl 2 , Mg 2 SO 4 , Mg(NO 3 ) 2 and NH 4 Cl.
11. The method of claim 9 , wherein the etchant comprises a fluoride containing acid and a filler.
12. The method of claim 11 , wherein the fluoride containing acid comprises any one or more of NH 4 F and NH 4 HF 2 .
13. The method of claim 11 , wherein the filler comprises an inorganic salt.
14. The method of claim 13 , wherein the inorganic salt comprises any one or more of BaSO 4 , CaF 2 , MgF 2 and kaolin.
15. The method of claim 9 , wherein the etchant comprises a soluble starch, a soluble polymeric surfactant or a combination of a soluble starch and a soluble polymeric surfactant.
16. The method of claim 15 , wherein the soluble polymeric surfactant comprises any one or more of polyacrylamide, polyacrylic acid, and poly(styrenesulfonate).
17. The method of claim 9 , wherein the etchant further comprises KNO 3 .
18. The method of claim 9 , further comprising forming an acid-resistant film on a second surface of the substrate before etching of the first surface.
19. The method of claim 9 , wherein etching a portion of the first surface of the substrate comprises contact the first surface with the etchant for less than 5 minutes.
20. The method of claim 19 , wherein removing a portion of the etched surface comprises contacting the etched surface with an acid solution for less than 15 minutes.