IP Library Granted Patent US 10,263,036
Granted Patent B2
US 10,263,036 · App. 15/508,430 · Granted Apr 16, 2019

Strain assisted spin torque switching spin transfer torque memory

Inventors: Sasikanth Manipatruni (Hillsboro, OR); Dmitri E. Nikonov (Beaverton, OR); Asif Khan (Berkeley, CA); Raseong Kim (Hillsboro, OR); Tahir Ghani (Portland, OR); Ian A. Young (Portland, OR)
Assignee: Intel Corporation
H01L27/228G11C11/161G11C11/1659G11C11/1675H01L27/20H01L41/20H01L43/02H01L43/08H01L43/10H01L27/11502H01L27/11507H01L28/55
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,263,036
App. No.
15/508,430
Granted
Apr 16, 2019
Kind
B2
Abstract

Described is an apparatus which comprises: a magnetic tunneling junction (MTJ) having a free magnetic layer; a piezoelectric layer; and a conducting strain transfer layer coupled to the free magnetic layer and the piezoelectric layer. Described is a method, which comprises: exciting a piezoelectric layer with a voltage driven capacitive stimulus; and writing to a MTJ coupled to the piezoelectric layer via a strain assist layer. Described is also an apparatus which comprises: a transistor; a conductive strain transfer layer coupled to the transistor; and a MTJ device having a free magnetic layer coupled to the conductive strain transfer layer.

Claims (45)

1. An apparatus comprising:

a magnetic junction including a free magnetic layer;

a first layer comprising piezoelectric material; and

a second layer with conductive strain transfer, wherein the second layer is coupled to the free magnetic layer and the piezoelectric layer, wherein the second layer includes one of: W, Cu, Nb, or STO (StTiO 3 ).

2. The apparatus of claim 1 comprises:

a first electrode coupled to the magnetic junction;

a second electrode coupled to the conductive strain transfer layer; and

a third electrode coupled to the first layer.

3. The apparatus of claim 2 comprises:

a first bit-line for coupling to the first electrode;

a source line for coupling to the second electrode; and

a second bit-line for coupling to the third electrode.

4. The apparatus of claim 3 , wherein:

the first bit-line is disposed on a fourth metal line layer,

the second bit-line is disposed on the second metal line layer, and

the source line is disposed on the zero metal line layer.

5. The apparatus of claim 4 , wherein the magnetic junction is positioned in a region for the second metal line layer.

6. The apparatus of claim 3 , wherein:

the first bit-line is disposed on a fourth metal line layer,

the second bit-line is disposed on the sixth metal line layer, and

the source line is disposed on the second metal line layer.

7. The apparatus of claim 3 comprises:

a first transistor coupled to the source line and the second electrode, wherein the first transistor is to couple the source line to the second electrode according to a voltage potential of a select line.

8. The apparatus of claim 7 comprises:

a second transistor coupled to the third electrode and the second bit-line, wherein the second transistor is to couple the second bit-line to the third electrode according to a voltage potential of the select line.

9. The apparatus of claim 1 , wherein the magnetic junction comprises layers including: IrMn; CoFe; Ru; CoFeB; MgO; and CoFeB.

10. The apparatus of claim 1 , wherein the free magnetic layer with magneto-striction includes one of: CoFeB, FeGa, MnGa, or Terfenol.

11. The apparatus of claim 1 , wherein the first layer is a composite layer.

12. An apparatus comprising:

a transistor;

a conductive strain transfer layer coupled to the transistor; and

a Magnetic Tunnel Junction (MTJ) device having a free magnetic layer coupled to the conductive strain transfer layer, wherein the conductive strain transfer layer includes one of: W, Cu, Nb, or STO (StTiO 3 ).

13. The apparatus of claim 12 , wherein the transistor has a gate terminal coupled to a select line.

14. The apparatus of claim 12 , comprises

a piezoelectric layer coupled to the conductive strain transfer layer.

15. The apparatus of claim 14 comprises:

a first electrode coupled to the MTJ;

a second electrode coupled to the conductive strain transfer layer; and

a third electrode coupled to the piezoelectric layer.

16. The apparatus of claim 15 , wherein the transistor is coupled to the second electrode, and wherein the transistor is operable to electrically couple the source line to the second electrode according to a voltage potential of the select line.

17. The apparatus of claim 16 comprises another transistor coupled to the third electrode and the select line.

18. The apparatus of claim 12 , wherein the MTJ comprises layers of:

an electrode; anti-ferromagnetic layer; fixed magnet layer; exchange coupling layer; fixed magnet layer; tunnel oxide; and free magnetic layer with magneto-striction.

19. The apparatus of claim 12 , wherein the MTJ is formed with layers of: IrMn; CoFe; Ru; CoFeB; MgO; and CoFeB.

20. The apparatus of claim 12 , wherein the free magnetic layer with magneto-striction is formed from one of: CoFeB, FeGa, MnGa, or Terfenol.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 15, 2022
From: INTEL CORPORATION
To: TAHOE RESEARCH, LTD.
Reel/Frame 061175/0176 →
Continuity (1)
Related Publication 20170287979A1 · Oct 5, 2017