Method of stem-based drilling of ultrathin silicon nitride nanopores and nanopore arrays
The invention concerns methods for preparing a nanoporous silicon nitride membrane comprising (i) ablating portions of at least one side of the membrane with an electron beam to reduce the thickness of the portions to between about 0.5 and 5 nanometers, and (ii) penetrating subportions of the ablated portions of the membrane with an electron beam to form nanopores having internal surfaces which are predominantly silicon rich compared to unablated portions of the membrane.
1. A method for preparing a nanoporous silicon nitride membrane comprising:
ablating portions of at least one side of the silicon nitride membrane with an electron beam to give rise to thinned portions such that each thinned portion defines an upper surface parallel to an upper surface of the silicon nitride membrane, each thinned portion having a thickness of between about 0.3 and about 5 nanometers; and
penetrating the thinned portions of the silicon nitride membrane with an electron beam to form nanopores extending through the thinned portions of the silicon nitride membrane;
wherein the thinned portions of the silicon nitride membrane are formed essentially of amorphous silicon having therein less than about 10% of the nitrogen present in silicon nitride.
2. The method of claim 1 , wherein each of said portions comprises one nanopore.
3. The method of claim 1 , wherein the nanopores have an hourglass shape or a cylinder shape.
4. The method of claim 1 , wherein the nanopores have a cross-section of less than or equal to about 1 nm at its widest point.
5. The method of claim 1 , wherein the nanopores have a cross-section of less than or equal to about 0.5 nm at its widest point.
6. The method of claim 1 , wherein the electron beam is a scanning transmission electron beam.
7. The method of claim 6 , wherein the thickness of each thinned portion is controlled utilizing measurements of current density.
8. The method of claim 1 , wherein each thinned portion is a square or rectangle with each dimension being in the range of about 10-30 nm.
9. The method of claim 1 , wherein each thinned portion is 20 nm×20 nm in surface area.
10. The method of claim 1 , wherein the nanopores are in the center of each thinned portion.
11. The method of claim 1 , wherein the silicon nitride membrane has a thickness in the range of from about 20 nm to about 100 nm prior to contact with the electron beam.
12. The method of claim 1 , wherein the thickness of each thinned portion is 2-4 nm.
13. The method of claim 1 , wherein the nanopores have a diameter in the range of 1 to ⅓ of the thickness of each thinned portion.
14. A macromolecule analysis component, comprising a nanoporous silicon nitride membrane having an upper surface, the component prepared by a method comprising:
ablating portions of at least one side of the silicon nitride membrane with an electron beam to give rise to thinned portions such that each thinned portion defines an upper surface parallel to the upper surface of the silicon nitride membrane, each thinned portion having a thickness of between about 0.3 and about 5 nanometers; and
penetrating the thinned portions of the silicon nitride membrane with an electron beam to form nanopores extending through the thinned portions of the silicon nitride membrane;
wherein the thinned portions of the silicon nitride membrane are formed essentially of amorphous silicon having therein less than about 10% of the nitrogen present in silicon nitride.
15. The macromolecule analysis component of claim 14 , wherein each of said thinned portions comprises one nanopore.
16. The macromolecule analysis component of claim 14 , wherein the nanopores have an hourglass shape or a cylinder shape.
17. The macromolecule analysis component of claim 14 , wherein the nanopores have a cross-section of less than or equal to about 1 nm at their widest point.
18. The macromolecule analysis component of claim 14 , wherein the nanopores have a cross-section of less than or equal to about 0.5 nm at their widest point.
19. The macromolecule analysis component of claim 14 , wherein the electron beam is a scanning transmission electron beam.
20. The method of claim 1 , wherein discontinuing of the ablating occurs when the N:Si ratio is equal to or less than 0.3.
21. The method of claim 1 , wherein discontinuing of the ablating occurs when the N:Si ratio is equal to or less than 0.1.
22. The macromolecule analysis component of claim 14 , wherein the silicon nitride membrane is freestanding.
23. A method of sequencing DNA or RNA sequences, comprising:
with a component that comprises a silicon nitride membrane,
the silicon nitride membrane comprising (i) a thick region having an upper surface, (ii) a thinned region formed in the thick region, the thinned region having an upper surface, the upper surface of the thick region being parallel to the upper surface of the thinned region,
the thinned region being formed essentially of amorphous silicon having therein less than about 10% of the nitrogen present in silicon nitride,
the thinned region having a thickness of from about 0.3 to about 5 nanometers;
and
the thinned region having a nanopore extending therethrough,
translocating a molecule through the nanopore and detecting a signal related to the translocation of the molecule through the nanopore.
24. The method of claim 23 , further comprising contacting a sample to a capture material that preferentially binds to the molecule and eluting the molecule from the capture material.
25. A macromolecule analysis component, comprising:
a silicon nitride membrane,
the silicon nitride membrane comprising (i) a thick region having an upper surface, (ii) a thinned region formed in the thick region, the thinned region having an upper surface, the upper surface of the thick region being parallel to the upper surface of the thinned region,
the thinned region being formed essentially of amorphous silicon having therein less than about 10% of the nitrogen present in silicon nitride,
the thinned region having a thickness of from about 0.3 to about 5 nanometers; and
the thinned region having a nanopore extending therethrough.
26. The macromolecule analysis component of claim 25 , wherein the nanopore has a diameter of from about ⅓ the thickness of the thinned region to about the thickness of the thinned region.
27. The macromolecule analysis component of claim 25 , wherein the nanopore has a diameter of from about 1 nm to about 2.5 nm.
28. The macromolecule analysis component of claim 25 , wherein the silicon nitride membrane has a thickness of from about 20 nm to about 100 nm.
29. The macromolecule analysis component of claim 25 , wherein the silicon nitride membrane is freestanding.