Semiconductor device
Based on a basic idea to effectively utilize a space created in a third wiring layer (M 3 ) by a zero-th wiring layer (M 0 ) which can exist by miniaturization of a FINFET, an auxiliary line AL is arranged in the space created in the third wiring layer, and this auxiliary line AL and a word line WL are electrically connected to each other. Thus, a measure (device) based on such new knowledge that rising time of a word line voltage is largely affected by a wiring resistance of the word line is achieved, a high-speed operation in an SRAM using the FINFET is achieved.
1. A semiconductor device comprising:
a memory cell having a FINFET,
a bit line pair connected to the memory cell,
a word line connected to the memory cell,
a gate wiring bridging over a protruding semiconductor layer which is integrally formed with a semiconductor substrate, extended in a first direction, and configured as a gate electrode of the FINFET;
a contact interlayer insulating film formed so as to cover the gate wiring,
a first interlayer insulating film formed on the contact interlayer insulating film,
a second interlayer insulating film formed on the first interlayer insulating film,
wherein the bit line pair extends in a second direction crossing the first direction and is disposed in a first wiring layer on the contact interlayer insulating film,
wherein the word line includes:
a first wiring extended in the first direction and disposed in a second wiring layer on the first interlayer insulating film and
a second wiring extended in the first direction, and disposed in a third wiring layer on the second interlayer insulating film,
wherein the first wiring and the second wiring are electrically connected via a first plug formed in the second interlayer insulating film.
2. The semiconductor device according to claim 1 ,
wherein the first wiring and the second wiring are electrically connected via a second plug formed in the second interlayer insulating film.
3. The semiconductor device according to claim 1 ,
wherein the first wiring and the second wiring are arranged so as to overlap in a plan view.
4. The semiconductor device according to claim 1 , further comprising a first power supply line connected to the memory cell and supplying a first voltage to the memory cell,
wherein the first power supply line includes a third wiring extended in the first direction and disposed in the second wiring layer.
5. The semiconductor device according to claim 4 ,
wherein the first power supply line further includes a fourth wiring extended in the first direction and disposed in the third wiring layer, and
wherein the third wiring and the fourth wiring are electrically connected via a third plug formed in the second interlayer insulating film.
6. The semiconductor device according to claim 5 ,
wherein the third wiring and the fourth wiring are electrically connected via a fourth plug formed in the second interlayer insulating film.
7. A semiconductor device comprising: a memory cell having a FINFET,
a bit line pair connected to the memory cell,
a word line connected to the memory cell,
a gate wiring bridging over a protruding semiconductor layer which is integrally formed with a semiconductor substrate, extended in a first direction, and configured as a gate electrode of the FINFET;
a contact interlayer insulating film formed so as to cover the gate wiring
a first interlayer insulating film formed on the contact interlayer insulating film,
a second interlayer insulating film formed on the first interlayer insulating film,
wherein the bit line pair extends in a second direction crossing the first direction and is disposed in a first wiring layer on the contact interlayer insulating film,
wherein the word line extends in the first direction and is disposed in a second wiring layer on the first interlayer insulating film, and
wherein the word line is disposed so as to overlap with a first wiring disposed in a third wiring layer on the second interlayer insulating film in plan view and is not electrically connected to the first wiring.
8. The semiconductor device according to claim 7 , further comprising a first power supply line connected to the memory cell and supplying a first voltage to the memory cell,
wherein the first power supply line has a second wiring extended in the first direction and disposed in the second wiring layer.
9. The semiconductor device according to claim 8 ,
wherein the first power supply line further includes a third wiring extended in the first direction and disposed in the third wiring layer, and
wherein the second wiring and the third wiring are electrically connected via a first plug formed in the second interlayer insulating film.
10. The semiconductor device according to claim 9 ,
wherein the second wiring and the third wiring are electrically connected via a second plug formed in the second interlayer insulating film.