IP Library › Granted Patent US 10,309,896
Granted Patent B2
US 10,309,896 · App. 15/525,431 · Granted Jun 4, 2019

Device for detecting plant stress and method for detecting plant stress

Inventors: Takeshi Fujiyama (Fukuoka, JP); Yuuji Terashima (Fukuoka, JP); Kazuhiro Yanagi (Fukuoka, JP)
Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
G01N21/359A01G7/04A01G7/045A01H1/04A01H3/02G01N21/3554G01N21/3151Y02P60/146
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Quick Facts
Patent No.
US 10,309,896
App. No.
15/525,431
Granted
Jun 4, 2019
Kind
B2
Abstract

There is provided a plant stress detection apparatus including a first light source that radiates a reference beam of a first wavelength that has a characteristic of tending not to be absorbed in water toward a plant by optical scanning, a second light source that radiates a measuring beam of a second wavelength that has a characteristic of tending to be absorbed in water toward the plant by optical scanning, and a detector that detects presence or absence of water or undulation of the plant based on reflection light of the reference beam that is reflected at an irradiation position of the plant that has a first irradiation area and reflection light of the measuring beam that is reflected at an irradiation position of the plant that has a second irradiation area that is different from the first irradiation area.

Claims (26)

1. A plant stress detection apparatus, comprising:

a first light source that radiates a reference beam of a first wavelength that has a characteristic of tending not to be absorbed in water toward a plant by optical scanning;

a second light source that radiates a measuring beam of a second wavelength that has a characteristic of tending to be absorbed in water toward the plant by optical scanning; and

a sensor that detects a presence or an absence of water and an undulation of the plant based on reflection light of the reference beam that is reflected at an irradiation position of the plant that has a first irradiation area and reflection light of the measuring beam that is reflected at an irradiation position of the plant that has a second irradiation area that is different from the first irradiation area.

2. The plant stress detection apparatus of claim 1 , further comprising:

a controller that sets the first irradiation area and the second irradiation area to vary.

3. The plant stress detection apparatus of claim 2 ,

wherein the controller sets a ratio of the first irradiation area to the second irradiation area as 1:1.

4. The plant stress detection apparatus of claim 3 , further comprising:

a camera that images the plant; and

a display controller that displays image data of the plant that is imaged by the camera on a display, the image data displaying a detection result of the presence or the absence of the water of the plant that is detected by the sensor.

5. The plant stress detection apparatus of claim 4 ,

wherein the display controller enlarges a designated location of the plant, with respect to the display, according to a zoom operation of the designated location of the plant, compares image data of the designated location and the detection result of the presence or the absence of the water, and displays the designated location and a comparison result on the display.

6. The plant stress detection apparatus of claim 1 , further comprising:

a camera that images the plant; and

a display controller that displays image data of the plant that is imaged by the camera on a display, the image data displaying a detection result of the presence or the absence of the water and the undulation of the plant that are detected by the sensor.

7. The plant stress detection apparatus of claim 6 ,

wherein the display controller enlarges a designated location of the plant, with respect to the display, according to a zoom operation of the designated location of the plant, compares image data of the designated location and the detection result of the presence or the absence of the water and the undulation, and displays the designated location and a comparison result on the display.

8. A plant stress detection method for a plant stress detection apparatus, the plant stress detection method comprising:

radiating a reference beam of a first wavelength that has a characteristic of tending not to be absorbed in water toward a plant by optical scanning;

radiating a measuring beam of a second wavelength that has a characteristic of tending to be absorbed in water toward the plant by optical scanning; and

detecting a presence or an absence of water and an undulation of the plant based on reflection light of the reference beam that is reflected at an irradiation position of the plant that has a first irradiation area and reflection light of the measuring beam that is reflected at an irradiation position of the plant that has a second irradiation area that is different from the first irradiation area.

9. The plant stress detection apparatus of claim 2 ,

wherein the controller is a processor.

10. The plant stress detection apparatus of claim 1 ,

wherein the sensor is a photo detector.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2017
From: FUJIYAMA, TAKESHI; TERASHIMA, YUUJI; YANAGI, KAZUHIRO
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 042912/0762 →
Priority Claims (1)
JP 2015-093641 · Apr 30, 2015 · national
Continuity (1)
Related Publication 20180284016A1 · Oct 4, 2018
Cited By (1)
US 12,185,683