IP Library Granted Patent US 10,556,405
Granted Patent B2
US 10,556,405 · App. 15/546,700 · Granted Feb 11, 2020

Production method for aerogel laminate, and aerogel laminate roll

Inventors: Tomohiko Kotake (Tokyo, JP); Masato Miyatake (Tokyo, JP); Chisato Kikkawa (Tokyo, JP); Hiroyuki Izumi (Tokyo, JP); Hikari Murai (Tokyo, JP)
Assignee: HITACHI CHEMICAL COMPANY, LTD.
B32B27/06B32B1/00C08J9/28B32B2264/102B32B2309/105C08J2383/04
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Quick Facts
Patent No.
US 10,556,405
App. No.
15/546,700
Granted
Feb 11, 2020
Kind
B2
Abstract

The present invention relates to a production method for an aerogel laminate including a support, and an aerogel layer disposed on the support and having a thickness of 200 μm or less, the method comprising a step of washing a wet gel laminate including the support and a wet gel layer disposed on the support by a roll-to-roll scheme.

Claims (6)

1. A production method for an aerogel laminate comprising a support, and an aerogel layer disposed on the support, the aerogel layer being a layer containing an aerogel having a structure derived from polysiloxane and having a thickness of 10 μm to 200 μm, the method comprising:

a step of washing a wet gel laminate comprising the support and a wet gel layer disposed on the support by a roll-to-roll scheme.

2. The production method for an aerogel laminate according to claim 1 , wherein a thickness of the wet gel layer is 400 μm or less.

3. The production method for an aerogel laminate according to claim 1 , wherein the wet gel contains a gel formed from a sol containing at least one selected from the group consisting of polysiloxane compounds having a reactive group in the molecule and hydrolysis products of the polysiloxane compounds.

4. The production method for an aerogel laminate according to claim 1 , wherein the wet gel layer contains a gel formed from a sol containing silica particles.

5. The production method for an aerogel laminate according to claim 1 , wherein the wet gel laminate is washed using a hydrophilic organic solvent.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
CHANGE OF NAME Recorded Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 11, 2017
From: KOTAKE, TOMOHIKO; MIYATAKE, MASATO; KIKKAWA, CHISATO; IZUMI, HIROYUKI; MURAI, HIKARI
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 043839/0332 →
Priority Claims (1)
JP 2015-013663 · Jan 27, 2015 · national
Continuity (1)
Related Publication 20180009199A1 · Jan 11, 2018