Optical structures and articles with multilayer stacks having high hardness and methods for making the same
Optically transparent articles and structures that include or are otherwise disposed on a substantially transparent substrate. These articles and structures also include a stack of N (N>2) bi-layers on the substrate, the stack having a thickness of at least 5 nm. Each bi-layer is defined by (a) a first layer; and (b) a second layer disposed on the first layer, the layers having at least one of different compositions and different microstructures. The stack has a stack refractive index between about 1.2 and about 2.2 or between about 100% and about 150% of a refractive index of the substrate, and a stack hardness of 15 GPa or greater when measured with a Berkovich Indenter Hardness Test along an indentation depth in the range from about 10% to about 50% of the thickness of the stack disposed on a glass test substrate having a hardness between 6.5 and 8 GPa.
1. An optical structure for a substrate, comprising:
a stack of N bi-layers, N being set at a value of two or more and the stack having a thickness of at least 5 nm,
wherein each bi-layer is defined by (a) a first layer; and (b) a second layer disposed on the first layer, the layers having at least one of different compositions and different microstructures,
wherein the stack has a stack refractive index between about 1.2 and about 2.2 and a stack hardness of 15 GPa or greater when measured with a Berkovich Indenter Hardness Test along an indentation depth in the range from about 10% to about 50% of the thickness of the stack, when the stack is disposed on a glass test substrate having a hardness between 6.5 and 8 GPa,
wherein each bi-layer has a thickness of approximately 3 nm or less, and
further wherein N is from 20 to 2000.
2. The structure according to claim 1 , wherein the first layer has an aluminum nitride composition and the second layer has a composition selected from the group consisting of aluminum oxynitride, silicon aluminum oxynitride and silicon aluminum nitride.
3. The structure according to claim 1 , wherein the first layer comprises a material selected from the group consisting of oxides, nitrides and fluorides of alkaline earth and transition metals, boron, tin, and combinations thereof.
4. The structure according to claim 1 , wherein the first layer comprises a material selected from the group consisting of silicon aluminum oxynitride, silicon oxynitride, aluminum oxynitride, silicon nitride, aluminum nitride, boron nitride, tin oxide, zirconium oxide, titanium oxide, silicon oxide, calcium oxide, aluminum oxide, boron oxide, magnesium oxide, barium fluoride, and calcium fluoride.
5. A device comprising:
a housing having front, back, and side surfaces;
electrical components that are at least partially inside the housing;
a display at or adjacent to the front surface of the housing; and
a cover substrate disposed over the display, wherein the cover substrate comprises the optical structure of claim 1 .
6. An optical structure for a substrate, comprising:
a stack of N bi-layers, N being set at a value of two or more and the stack having a thickness of at least 5 nm,
wherein each bi-layer is defined by (a) a first layer; and (b) a second layer disposed on the first layer, the layers having at least one of different compositions and different microstructures,
wherein the stack has a stack refractive index between about 100% and about 150% of a refractive index of the substrate, and a stack hardness of 15 GPa or greater when measured with a Berkovich Indenter Hardness Test along an indentation depth in the range from about 10% to about 50% of the thickness of the stack, when the stack is disposed on a glass test substrate having a hardness between 6.5 and 8 GPa,
wherein each bi-layer has a thickness of approximately 3 nm or less, and
further wherein N is from 20 to 2000.
7. The structure according to claim 6 , wherein the first layer has an aluminum nitride composition and the second layer has a composition selected from the group consisting of aluminum oxynitride, silicon aluminum oxynitride and silicon aluminum nitride.
8. The structure according to claim 6 , wherein the first layer comprises a material selected from the group consisting of oxides, nitrides and fluorides of alkaline earth and transition metals, boron, tin, and combinations thereof.
9. The structure according to claim 6 , wherein the first layer comprises a material selected from the group consisting of silicon aluminum oxynitride, silicon oxynitride, aluminum oxynitride, silicon nitride, aluminum nitride, boron nitride, tin oxide, zirconium oxide, titanium oxide, silicon oxide, calcium oxide, aluminum oxide, boron oxide, magnesium oxide, barium fluoride, and calcium fluoride.
10. A device comprising:
a housing having front, back, and side surfaces;
electrical components that are at least partially inside the housing;
a display at or adjacent to the front surface of the housing; and
a cover substrate disposed over the display, wherein the cover substrate comprises the optical structure claim 6 .
11. A method of making an optically transparent article, comprising the steps:
forming a stack of N bi-layers on a substantially transparent substrate, N being set at a value of two or more and the stack having a thickness of at least 5 nm, wherein the step of forming the stack of N bi-layers further comprises:
(a) depositing a first layer; and
(b) depositing a second layer on the first layer,
wherein the steps of depositing the first and second layers are repeated N times, and the first and second layers have at least one of different compositions and different microstructures,
wherein the stack has a stack refractive index between 100% and about 150% of a refractive index of the substrate, and the article has an article hardness of 15 GPa or greater, the article hardness measured on the stack with a Berkovich Indenter Hardness Test along an indentation depth ranging from about 10% to about 50% of the thickness of the stack,
wherein each bi-layer has a thickness of approximately 3 nm or less, and
further wherein N is from 20 to 2000.
12. The method according to claim 11 , wherein the forming step is conducted with a reactive sputtering process.
13. The method according to claim 11 , wherein the first layer has an aluminum nitride composition and the second layer has an aluminum oxynitride composition.
14. The method according to claim 11 , wherein the steps of depositing the first and second layers are conducted by alternating no oxygen gas flow and oxygen gas flow in a chamber containing the substrate, respectively.
15. The method according to claim 11 , wherein N is set to at least 100, the thickness of the stack is 500 nm or greater, the article hardness is at least 17 GPa and the refractive index of the stack is less than 2.1.
16. The method according to claim 11 , wherein N is set to at least 100, the thickness of the stack is 500 nm or greater, the article hardness is at least 20 GPa and the refractive index of the stack is less than 2.1.
17. The method according to claim 11 , wherein the forming step is conducted with a metal mode sputtering process.