Thermal processing apparatus and thermal processing method
An upper plate on which a substrate is placed is cooled or heated by a thermal processor. The temperature of the thermal processor is adjusted by a temperature adjuster. The temperature of the upper plate is detected. A control value that is to be applied to the temperature adjuster in order to maintain the temperature of the upper plate at a set value is calculated as a control arithmetic value on the basis of the detected temperature. When the control arithmetic value decreases to a value less than a second threshold value, a first control that applies the control arithmetic value to the temperature adjuster is performed. When the control arithmetic value increases to a value not less than a first threshold value, a second control that applies a control set value higher than the control arithmetic value to the temperature adjuster is performed.
1. A thermal processing apparatus that performs thermal processing on a substrate, comprising:
a plate on which the substrate is placed;
a thermal processor arranged to cool or heat the plate;
a temperature adjuster that receives a control value and adjusts a temperature of the thermal processor based on the control value;
a temperature detector that detects a temperature of the plate;
a control value calculator that calculates the control value that is to be applied to the temperature adjuster in order to maintain the temperature of the plate at a set value, as a control arithmetic value indicating a magnitude of power, on a basis of the temperature detected by the temperature detector; and
a control switch that performs a first control that applies the control arithmetic value calculated by the control value calculator to the temperature adjuster as the control value, and a second control that applies a control set value higher than the control arithmetic value calculated by the control value calculator to the temperature adjuster as the control value,
wherein the control switch switches from the first control to the second control when the control arithmetic value calculated by the control value calculator increases to a value not less than a first threshold value, and switches from the second control to the first control before the temperature of the plate reaches the set value when the control arithmetic value calculated by the control value calculator decreases to a value less than a second threshold value.
2. The thermal processing apparatus according to claim 1 , wherein the control set value in the second control is higher than the predetermined first and second threshold values and not higher than a maximum control value relative to the temperature adjuster.
3. The thermal processing apparatus according to claim 1 , wherein the first threshold value and the second threshold value are equal to each other.
4. The thermal processing apparatus according to claim 1 , wherein the control set value is a ratio between power that is to be supplied to the thermal processor in order to maintain the temperature of the plate at the set value and maximum power that can be output by the temperature adjuster.
5. The thermal processing apparatus according to claim 1 , wherein the thermal processor includes a Peltier element.
6. A thermal processing method for performing thermal processing on a substrate, comprising:
cooling or heating a plate on which the substrate is placed by a thermal processor;
adjusting a temperature of the thermal processor by a temperature adjuster based on a control value received by the temperature adjuster;
detecting a temperature of the plate;
calculating the control value that is to be applied to the temperature adjuster in order to maintain the temperature of the plate at a set value, as a control arithmetic value indicating a magnitude of power, on a basis of the detected temperature; and
performing a first control that applies the calculated control arithmetic value to the temperature adjuster as the control value, and a second control that applies a control set value higher than the calculated control arithmetic value to the temperature adjuster as the control value,
wherein the performing of the first control and the second control includes switching from the first control to the second control when the calculated control arithmetic value increases to a value not less than a first threshold value, and switching from the second control to the first control before the temperature of the plate reaches the set value when the calculated control arithmetic value decreases to a value less than a second threshold value.
7. The thermal processing apparatus according to claim 1 , wherein the control arithmetic value is a ratio between power that is to be supplied to the thermal processor in order to maintain the temperature of the plate at the set value and maximum power that can be output by the temperature adjuster.
8. A thermal processing apparatus that performs thermal processing on a substrate, comprising:
a plate on which the substrate is placed;
a thermal processor arranged to cool or heat the plate;
a temperature adjuster that receives a control value and adjusts a temperature of the thermal processor based on the control value;
a temperature detector that detects a temperature of the plate;
a hardware processor configured to calculate the control value that is to be applied to the temperature adjuster in order to maintain the temperature of the plate at a set value, as a control arithmetic value indicating a magnitude of power, on a basis of the temperature detected by the temperature detector, and perform a first control that applies the calculated control arithmetic value to the temperature adjuster as the control value, and a second control that applies a control set value higher than the calculated control arithmetic value to the temperature adjuster as the control value,
wherein the hardware processor is configured to switch from the first control to the second control when the calculated control arithmetic value increases to a value not less than a first threshold value, and switch from the second control to the first control before the temperature of the plate reaches the set value when the calculated control arithmetic value decreases to a value less than a second threshold value.