Solid-state imaging device and electronic apparatus
This technology relates to a solid-state imaging device and an electronic apparatus by which image quality can be enhanced. The solid-state imaging device includes a pixel region in which a plurality of pixels are arranged, a first wiring, a second wiring, and a shield layer. The second wiring is formed in a layer lower than that of the first wiring, and the shield layer is formed in a layer lower at least than that of the first wiring. This technology is applicable to a CMOS image sensor, for example.
1. A solid-state imaging device, comprising:
a pixel region that includes a plurality of pixels;
a first wiring in a first layer;
a second wiring in a second layer, wherein the second layer is lower than the first layer;
a first shield layer between the first wiring in the first layer and the second wiring in the second layer;
a laminated body that includes a first semiconductor substrate as an uppermost layer and a second semiconductor substrate; and
a second shield layer in the first semiconductor substrate,
wherein
the first semiconductor substrate includes the pixel region and the first wiring,
the second semiconductor substrate includes the second wiring and a logic circuit,
the first shield layer is, above the second wiring, in the second semiconductor substrate,
a potential associated with the first shield layer is a fixed potential,
the second shield layer is connected to a ground wiring of the first semiconductor substrate through a first plurality of via holes,
the first semiconductor substrate has a connection conductor connected to the first wiring, and
the connection conductor is in contact with the second wiring of the second semiconductor substrate.
2. The solid-state imaging device according to claim 1 , wherein
the first shield layer includes permalloy and one of a Tantalum-based metal or a Titanium-based metal, and
a relative permeability of the permalloy is greater than 100.
3. The solid-state imaging device according to claim 1 , wherein
the first shield layer is connected to a ground wiring of the second semiconductor substrate through a second plurality of via holes.
4. The solid-state imaging device according to claim 1 , wherein
the first semiconductor substrate has a first electrode connected to the first wiring,
the second semiconductor substrate has a second electrode connected to the second wiring,
the second electrode is at a position on a surface of a first semiconductor substrate side of the second semiconductor substrate,
the position corresponds to the first electrode,
the first electrode and the second electrode are configured to electrically connect the first semiconductor substrate and the second semiconductor substrate.
5. The solid-state imaging device according to claim 1 , wherein
the first shield layer has a flat film shape, and
the first shield layer has an area greater than an area of the pixel region.
6. The solid-state imaging device according to claim 1 , wherein the first shield layer is in contact with a lower surface of the second wiring.
7. The solid-state imaging device according to claim 1 , wherein the first shield layer is divided into a plurality of portions.
8. The solid-state imaging device according to claim 1 , wherein a part of the first shield layer includes a cavity.
9. The solid-state imaging device according to claim 1 , wherein the first shield layer is an electromagnetic shield.
10. An electronic apparatus, comprising:
a solid-state imaging device which includes:
a pixel region that includes a plurality of pixels;
a first wiring in a first layer;
a second wiring in a second layer, wherein the second layer is lower than the first layer;
a first shield layer between the first wiring in the first layer and the second wiring in the second layer; and
a laminated body that includes a first semiconductor substrate as an uppermost layer and a second semiconductor substrate; and
a second shield layer in the first semiconductor substrate, wherein
the first semiconductor substrate includes the pixel region and the first wiring,
the second semiconductor substrate includes the second wiring and a logic circuit,
the first shield layer is, above the second wiring, in the second semiconductor substrate,
a potential associated with the first shield layer is a fixed potential,
the second shield layer is connected to a ground wiring of the first semiconductor substrate through a plurality of via holes,
the first semiconductor substrate has a connection conductor connected to the first wiring, and
the connection conductor is in contact with the second wiring of the second semiconductor substrate.