IP Library Granted Patent US 10,442,159
Granted Patent B2
US 10,442,159 · App. 15/562,472 · Granted Oct 15, 2019

Electromagnetic shielding material

Inventors: Koichiro Tanaka (Ibaraki, JP); Kenji Sato (Tokyo, JP)
Assignee: JX Nippon Mining & Metals Corporation
B32B15/08C23C8/10C23C28/00H05K9/00H05K9/0073B32B2250/05B32B2250/42B32B2307/206B32B2457/00
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Quick Facts
Patent No.
US 10,442,159
App. No.
15/562,472
Granted
Oct 15, 2019
Kind
B2
Abstract

Provided is an electromagnetic shielding material having improved electromagnetic shielding properties, light weight properties and formability. The present invention relates to an electromagnetic shielding material having a structure in which at least three metal foils are laminated via insulating layers, wherein all of combinations of the metal foils and the insulating layers making up the electromagnetic shielding material satisfy the equation: σ M ×d M ×d R ≥3×10 −3 , in which: the symbol σ M represents conductivity of each metal foil at 20° C. (S/m); the symbol d M represents the thickness of each metal foil (m); and the symbol d R represents the thickness of each insulating layer (m).

Claims (16)

1. An electromagnetic shielding material having a structure in which at least three metal foils are laminated via insulating layers, the electromagnetic shielding material having a thickness of each insulating layer of 80 μm or more and a total thickness of the metal foils of from 15 to 150 μm, the total thickness of the electromagnetic shielding material being from 50 to 1051 μm,

wherein, in the case that the metal foils are aluminum, the thickness of each aluminum foil is 20 μm or more,

wherein every combination of the metal foils and the insulating layers making up the electromagnetic shielding material satisfy the equation: σ M ×d M ×d R ≥3×10 −3 , and

wherein the minimum value among possible combinations of the metal foils and the insulating layers satisfies the equation: minimum σ M ×d M ×d R ≤4.9×10 −1 , in which:

the symbol σ M represents conductivity of each metal foil at 20° C. (S/m);

the symbol d M represents the thickness of each metal foil (m); and

the symbol d R represents the thickness of each insulating layer (m).

2. The electromagnetic shielding material according to claim 1 , wherein the conductivity of each metal foil at 20° C. is 1.0×10 6 S/m or more.

3. The electromagnetic shielding material according to claim 1 , wherein the thickness of each metal foil is from 4 to 100 μm.

4. The electromagnetic shielding material according to claim 1 , wherein each insulating layer has a relative dielectric constant at 20° C. of from 2.0 to 10.0.

5. The electromagnetic shielding material according to claim 1 , wherein the thickness of each insulating layer is 100 μm or more.

6. The electromagnetic shielding material according to claim 1 , wherein the total thickness of the metal foils is from 15 to 100 μm.

7. A covering material or a cladding material for electric and electronic devices, comprising the electromagnetic shielding material according to claim 1 .

8. An electric or electronic device comprising the covering material or the cladding material according to claim 7 .

9. The electromagnetic shielding material according to claim 1 , wherein the thickness of each insulating layer is 500 μm or less.

10. The electromagnetic shielding material according to claim 1 , wherein each metal foil and each insulating layer are laminated without using an adhesive.

Assignments (2)
CHANGE OF ADDRESS Recorded Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 14, 2017
From: TANAKA, KOICHIRO; SATO, KENJI
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 044115/0081 →
Priority Claims (1)
JP 2015-070091 · Mar 30, 2015 · national
Continuity (1)
Related Publication 20180079177A1 · Mar 22, 2018