Semiconductor device with a well region

1. A semiconductor device, comprising:

a semiconductor substrate;

a semiconductor layer of a first conductivity type being formed on said semiconductor substrate;

a field insulating film being formed on a surface of said semiconductor layer;

a surface electrode being formed on said surface of said semiconductor layer within an inner periphery of said field insulating film and extending onto said field insulating film;

a well region of a second conductivity type being formed at a surface-layer part of said semiconductor layer in contact with said surface electrode and extending outward beyond an outer peripheral edge of said surface electrode;

a surface protective film being made of an insulating material and formed on said surface electrode and said field insulating film to cover an outer peripheral edge of said surface electrode and an outer peripheral edge of said field insulating film;

a sealing gel being formed, on said semiconductor layer and said surface protective film, on an outer peripheral part of said semiconductor layer; and

a rear surface electrode formed on a rear surface of said semiconductor substrate, wherein

x is defined as a position, at a surface between the semiconductor layer and the field insulating film, of an end of a depletion layer extending from said well region toward an outer peripheral direction of said semiconductor layer on said surface of said semiconductor layer when a rated voltage V [V] is applied to said rear surface electrode,

W 1 is defined as a distance between said position x and said outer peripheral edge of said surface electrode in said outer peripheral direction,

W 2 is defined as a distance between said position x and said outer peripheral edge of said field insulating film in said outer peripheral direction,

t [μm] is defined as a film thickness of said field insulating film, and

a layout of a terminal part is defined so that an electrical field in said field insulating film at said position x expressed as W 2 V/t(W 1 +W 2 ) is 3 MV/cm or smaller.

2. The semiconductor device according to claim 1 , wherein

said field insulating film mainly contains silicon oxide.

3. The semiconductor device according to claim 1 , wherein

said surface protective film is polyimide.

4. The semiconductor device according to claim 1 , wherein

said gel is a silicone gel.

5. The semiconductor device according to claim 1 , wherein

said surface electrode is Schottky-connected to said semiconductor layer.

6. The semiconductor device according to claim 1 , wherein

said well region at said surface-layer part of said semiconductor layer includes a terminal well region of a second conductivity type formed in a terminal part and an active well region of a second conductivity type provided in an active region to be separated from said terminal well region, and

said surface electrode is ohmic-connected to said well region.

7. The semiconductor device according to claim 1 , further comprising

a plurality of separate well regions which are separated from each other and arranged outside said well region, in addition to said well region.

8. The semiconductor device according to claim 1 , wherein

said semiconductor substrate and said semiconductor layer are made of a wide band gap semiconductor material.

9. The semiconductor device according to claim 1 , wherein

each of said semiconductor substrate and said semiconductor layer is made of a silicon carbide semiconductor material.