IP Library Granted Patent US 10,745,568
Granted Patent B2
US 10,745,568 · App. 15/568,532 · Granted Aug 18, 2020

Surface treatment composition

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Quick Facts
Patent No.
US 10,745,568
App. No.
15/568,532
Granted
Aug 18, 2020
Kind
B2
Abstract

The present invention relates to an acidic aqueous composition for treating of zirconium-pretreated metal-based substrate surfaces such as steel metals or aluminium surfaces, a process for treating the substrate surfaces with the composition and the use of the composition as post-treatment of zirconium-pretreated metal-based substrate surfaces for subsequent electrocoating of the surfaces to increase corrosion resistance of said metal-based surfaces prior to electro-coating (e-coat) applications and increases detergent and chemical resistance of treated surfaces used in the white goods industry. The acidic aqueous composition comprises trivalent chromium ions; and hexafluorozirconate ions; characterized in that the source of trivalent chromium ions is a trivalent chromium nitrate salt.

Claims (13)

1. A process for treating of zirconium-pretreated metal-based substrate surfaces, comprising: i providing a zirconium-pretreated metal-based substrate; and ii. applying to surfaces of the substrate an acidic aqueous composition comprising: a. trivalent chromium ions; and b. hexafluorozirconate ions; characterized in that the sole source of the trivalent chromium ions is a trivalent chromium nitrate salt.

2. The process according to claim 1 wherein the concentration of trivalent chromium ions ranges between 10 and 5,000 mg/L.

3. The process according to claim 1 wherein the zirconium-pretreated metal-based substrate surfaces are obtained by pretreating with an aqueous chromium ion-free composition comprising hexafluorozirconate ions.

4. The process according to claim 1 wherein the trivalent chromium nitrate salt is Cr(NO 3 ) 3 or Cr(NO 3 ) 3 ·9 H 2 O.

5. The process according to claim 1 wherein the concentration of hexafluorozirconate ions independently ranges between 10 and 10,000 mg/L.

6. The process according to claim 1 wherein the source of hexafluorozirconate ions independently is selected from the group consisting of hexafluorozirconic acid, ammonium hexafluorozirconate, an alkali metal hexafluorozirconate, an alkaline earth metal hexafluorozirconate and a transition metal hexafluorozirconate.

7. The process according to claim 1 wherein a pH value of the acidic aqueous composition ranges between 2.0 and 5.5.

8. The process according to claim 1 wherein the acidic aqueous composition is free from added sulfate ions and chloride ions.

9. The process according to claim 1 wherein the acidic aqueous composition is free from added magnesium ions, nickel ions and zinc ions.

10. The process according to claim 1 wherein the zirconium-pretreated metal-based substrate surfaces are zirconium-pretreated steel substrate surfaces or zirconium-pretreated aluminum substrate surfaces or zirconium-pretreated aluminum alloy substrate surfaces.

11. The process according to claim 1 wherein the treating according to step ii. is by spraying the acidic aqueous composition onto the zirconium-pretreated metal-based substrate surfaces at a temperature of between 20 to 25° C.

12. The process according to claim 1 wherein the zirconium-pretreated metal-based substrate surfaces are derived by step i1, treating the metal-based substrate surfaces with an aqueous chromium ion-free composition comprising hexafluorozirconate ions to obtain said zirconium-pretreated metal-based substrate surfaces prior to step ii.

13. The process according to claim 12 wherein the aqueous chromium ion-free composition according to step i1 has a pH of between 4.0 and 5.0 and a concentration of hexafluorozirconate ions between 100 and 5,000 mg/L.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Aug 18, 2022
From: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH); ATOTECH USA, LLC
Reel/Frame 061521/0103 →
SECURITY INTEREST Recorded Mar 18, 2021
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 055650/0093 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 23, 2017
From: ROUSSEAU, AGNES; TAYLOR, STEPHEN
To: ATOTECH DEUTSCHLAND GMBH
Reel/Frame 043921/0072 →