IP Library › Granted Patent US 10,145,750
Granted Patent B2
US 10,145,750 · App. 15/572,072 · Granted Dec 4, 2018

MEMS pressure sensing element

Inventor: Guoguang Zheng (Weifang, CN)
Assignee: GOERTEK. INC.
G01L9/0051G01L9/02G01L2009/0066
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Quick Facts
Patent No.
US 10,145,750
App. No.
15/572,072
Granted
Dec 4, 2018
Kind
B2
Abstract

An MEMS pressure sensing element is disclosed, comprising a substrate with a groove; a pressure-sensitive film on the substrate for sealing an opening of the groove to form a sealed cavity body; and a pressure-sensitive beam suspended in the sealed cavity body and parallel with the pressure-sensitive film provided with varistors, wherein a center of the pressure-sensitive beam is fixedly connected to that of the pressure-sensitive film, and a periphery is fixedly connected to a bottom wall of the groove of the substrate, such that the pressure-sensitive film drives the pressure-sensitive beam to bending deformation under an external pressure.

Claims (10)

1. A MEMS pressure sensing element comprising:

a substrate provided with a groove;

a pressure-sensitive film disposed on the substrate, the pressure-sensitive film sealing an opening of the groove to form a sealed cavity body; and

a pressure-sensitive beam suspended in the sealed cavity body and parallel to the pressure-sensitive film, the pressure-sensitive beam being provided with a varistor; and

wherein the pressure-sensitive beam is cross-shaped, a center of the pressure-sensitive beam is fixedly connected to that of the pressure-sensitive film by a first anchor; and a periphery of the pressure-sensitive beam is fixedly connected to a bottom wall of the groove of the substrate, such that the pressure-sensitive film drives the pressure-sensitive beam to bending deformation under an external pressure;

wherein an end of four sides of the pressure-sensitive beam away from the center of the pressure-sensitive beam is fixedly connected to the bottom wall of the groove of the substrate by an anchor ring respectively; and

wherein a limiting protrusion part is further disposed in the sealed cavity body, and the limiting protrusion is disposed on the bottom wall of the groove of the substrate and located below the center of the pressure-sensitive beam.

2. The element according to claim 1 , the element comprising four varistors, which are disposed on four sides of the pressure-sensitive beam correspondingly and form a Wheatstone bridge.

3. The element according to claim 1 , wherein the pressure-sensitive film is made of monocrystalline silicon material.

4. The element according to claim 1 , wherein a thickness of the pressure-sensitive film is 10 μm-30 μm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2020
From: GOERTEK, INC.
To: WEIFANG GOERTEK MICROELECTRONICS CO., LTD.
Reel/Frame 052846/0443 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2017
From: ZHENG, GUOGUANG
To: GOERTEK.INC
Reel/Frame 044044/0200 →
Priority Claims (1)
CN 2015 1 0367571 · Jun 29, 2015 · national
Continuity (1)
Related Publication 20180136062A1 · May 17, 2018