Resin composition, and display device comprising black bank manufactured by using same

1. A negative type photosensitive resin composition comprising:

a compound of the following Chemical Formula 1;

an alkali soluble resin binder;

a polyfunctional monomer;

a colorant;

a photoinitiator; and

a solvent, wherein

in Chemical Formula 1,

R 1 is hydrogen; or a linear or branched alkyl group,

R 2 is CHR 6 CH(OH)CHR 7 (OH), and wherein, R 6 and R 7 are hydrogen; or a linear or branched alkyl group,

X is —NH— or —O—,

R 3 is a linear or branched alkylene; or aralkylene, and

Y is a linear or branched alkylene, and n is an integer of 1 to 10.

2. The negative type photosensitive resin composition of claim 1 , wherein Chemical Formula 1 is represented by the following Chemical Formula 2:

in Chemical Formula 2,

R 1 , R 2 , R 3 , X, and n are the same as those defined in Chemical Formula 1,

Y 1 and Y 3 are a direct bond; or a linear or branched alkylene, and

Y 2 is a linear or branched alkylene.

3. The negative type photosensitive resin composition of claim 1 , wherein Chemical Formula 1 is represented by the following Chemical Formula 3:

in Chemical Formula 3, the definitions of the substituents are the same as those in Chemical Formula 1.

4. The negative type photosensitive resin composition of claim 1 , wherein Chemical Formula 1 is represented by the following Chemical Formula 4 or 5:

in Chemical Formulae 4 and 5, the definitions of the substituents are the same as those in Chemical Formula 1.

5. The negative type photosensitive resin composition of claim 1 , wherein the compound of Chemical Formula 1 is comprised in an amount of 100 ppm to 3,000 ppm based on the entire resin composition.

6. The negative type photosensitive resin composition of claim 1 , further comprising:

50 ppm to 450 ppm of a surfactant.

7. The negative type photosensitive resin composition of claim 6 , wherein the surfactant is a fluorine-based or silicone-based surfactant.

8. The negative type photosensitive resin composition of claim 1 , wherein the colorant comprises a black organic pigment.

9. The negative type photosensitive resin composition of claim 8 , wherein the colorant further comprises one or more pigments which absorb light with at least a portion of wavelengths from 400 nm to 600 nm.

10. The negative type photosensitive resin composition of claim 9 , wherein a weight ratio of the black organic pigment and the pigment which absorbs light with at least a portion of wavelengths from 400 nm to 600 nm is 100:0 to 90:10.

11. The negative type photosensitive resin composition of claim 8 , wherein the colorant further comprises a high-resistance carbon black having a volume resistance of 10 11 Ω·cm or more based on a content of 50 wt % used in a paint film.

12. The negative type photosensitive resin composition of claim 11 , wherein a weight ratio of the black organic pigment and the high-resistance carbon black is 99.5:0.5 to 90:10.

13. The negative type photosensitive resin composition of claim 1 , wherein the negative type photosensitive resin composition has a volume resistance of 10 12 Ω·cm or more, a permittivity of 3 to 6, a light transmittance of less than 1% at 380 nm to 600 nm, an optical density (OD) of 1/μm or more, and a tapered angle of 15° to 35° when a paint film having a thickness of 2 μm is formed.

14. The negative type photosensitive resin composition of claim 1 , wherein the alkali soluble resin binder, the polyfunctional monomer, and the photoinitiator are each comprised in an amount of 0.5 to 10 wt % based on the entire resin composition, and the colorant is comprised in an amount of 1 to 50 wt % based on the entire resin composition.

15. A display apparatus comprising a black bank formed from a method comprising:

applying the negative type photosensitive resin composition of claim 1 on a surface of a substrate,

removing the solvent of the negative type photosensitive resin composition by pre-bake to obtain a pre-baked film;

forming a pattern in the pre-baked film by irradiating through a predetermined pattern mask;

developing the irradiated film using an aqueous alkaline solution;

washing the developed film with a solution comprising water; and drying the film.