IP Library Granted Patent US 10,137,519
Granted Patent B2
US 10,137,519 · App. 15/591,674 · Granted Nov 27, 2018

Flux reservoir apparatus

Inventors: Kohei Seyama (Tokyo, JP); Shoji Wada (Tokyo, JP)
Assignee: SHINKAWA LTD.
B23K3/082B23K2201/42
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Quick Facts
Patent No.
US 10,137,519
App. No.
15/591,674
Granted
Nov 27, 2018
Kind
B2
Abstract

A flux reservoir apparatus ( 100, 200 ) includes a stage ( 12 ) having a recessed portion ( 13 ) for reserving flux ( 51, 52, 53 ) therein and a flux pot ( 20 ) composed of an annular member having a through hole ( 30 ) through which the flux ( 51, 52, 53 ) flows, the flux pot arranged to move back and forth on the surface ( 14 ) of the stage ( 12 ) to feed the flux ( 51, 52, 53 ) into the recessed portion ( 13 ) and to smooth the surface of the flux ( 51, 52, 53 ), in which the through hole ( 30 ) is an elongated hexagonal hole with a length greater than the width of the recessed portion ( 13 ) in the direction perpendicular to the back-and-forth direction, and in which the bottom surface of a flux pot main body ( 21 ) is a chevron surface. This reduces leakage of the flux ( 51, 52, 53 ) in the flux reservoir apparatus ( 100, 200 ).

Claims (8)

1. A flux reservoir apparatus comprising:

a stage having a recessed portion for reserving flux therein;

a flux pot composed of an annular member having a through hole through which the flux flows, the flux pot arranged to move back-and-forth on a surface of the stage to feed the flux in the through hole into the recessed portion and to smooth a surface of the flux with a bottom surface of the flux pot; and

a rotation mechanism configured to rotate the flux pot and tilt the flux pot in a direction opposite to a moving direction when the flux pot is moving back-and-forth;

wherein the through hole of the flux pot is an elongated hexagonal hole elongated in a direction perpendicular to a back-and-forth direction with a length greater than the width of the recessed portion of the stage in the direction perpendicular to the back-and-forth direction, and wherein

wherein the bottom surface of the flux pot is an end face of the through hole and a chevron surface in which two surfaces are connected at an angle to define a linear ridge.

2. The flux reservoir apparatus according to claim 1 , further comprising

a back-and-forth drive mechanism disposed below the surface of the stage and arranged to rotatably support the flux pot and to apply a force below the surface of the stage in the back-and-forth direction to the flux pot.

Assignments (2)
MERGER Recorded Dec 4, 2025
From: SHINKAWA LTD.
To: YAMAHA ROBOTICS CO., LTD.
Reel/Frame 073833/0572 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 12, 2017
From: SEYAMA, KOHEI; WADA, SHOJI
To: SHINKAWA LTD.
Reel/Frame 042988/0594 →
Priority Claims (1)
JP 2014-229026 · Nov 11, 2014 · national
Continuity (2)
Continuation PCTJP2015074104 · Aug 26, 2015
Related Publication 20170297131A1 · Oct 19, 2017