Films derived from two or more chemically distinct block copolymers, methods of making same, and uses thereof
Methods of making blended, isoporous, asymmetric (graded) films (e.g. ultrafiltration membranes) comprising two or more chemically distinct block copolymers and blended, isoporous, asymmetric (graded) films (e.g. ultrafiltration membranes) comprising two or more chemically distinct block copolymers. The generation of blended membranes by mixing two chemically distinct block copolymers in the casting solution demonstrates a pathway to advanced asymmetric block copolymer derived films, which can be used as ultrafiltration membranes, in which different pore surface chemistries and associated functionalities can be integrated into a single membrane via standard membrane fabrication, i.e. without requiring laborious post-fabrication modification steps. The block copolymers may be diblock, triblock and/or multiblock mixes and some block copolymers in the mix may be functionally modified. Triblock copolymers comprising a reactive group (e.g., sulfhydryl group) terminated block and films comprising the triblock copolymers.
1. A method for forming a blended film having an isoporous surface layer and a substructure having an asymmetric pore structure comprising at least two chemically distinct block copolymers comprising:
a) forming a film comprising the at least two chemically distinct block copolymers using a deposition solution comprising the at least two chemically distinct block copolymers, wherein each chemically distinct block copolymer has at least one hydrophilic block and at least one hydrophobic block, and a solvent system;
b) removing at least a portion of the solvent system from the film; and
c) contacting the film from b) with a phase inversion solvent system, such that the blended film is formed, wherein the size of the pores of the isoporous surface layer have a pore size distribution of less than 0.3, wherein the pore size distribution is defined as σ/μ, obtained through a lognormal distribution fit.
2. The method of claim 1 , wherein the at least two chemically distinct block copolymers are selected from the group consisting of diblock copolymers, triblock terpolymers, tetrablock copolymers and combinations thereof.
3. The method of claim 1 , wherein at least one of the at least two chemically distinct block copolymers is a triblock terpolymer or at least two of the at least two chemically distinct block copolymers is a triblock terpolymer.
4. The method of claim 1 , wherein the deposition solution further comprises a homopolymer and the film further comprises the homopolymer.
5. The method of claim 1 , wherein the concentration of the at least two chemically distinct block copolymers is from 5 to 30% by weight.
6. A blended film comprising at least two chemically distinct block copolymers, wherein the film comprises:
i) a surface layer having a thickness of 20 nm to 500 nm,
ii) a plurality of pores 5 nm to 100 nm in size,
iii) a pore density of at least 1×10 14 pores/m 2 , and
iv) an asymmetric hierarchical substructure having a thickness of 5 microns to 500 microns and pores having a size of 5 nm to 100 microns,
wherein the surface layer is isoporous and the substructure has an asymmetric pore structure and the size of the pores of the isoporous surface layer have a pore size distribution of less than 0.3, wherein the pore size distribution is defined as σ/μ, obtained through a lognormal distribution fit.
7. The blended film of claim 6 , wherein the at least two chemically distinct block copolymers are selected from the group consisting of diblock copolymers, triblock terpolymers, tetrablock copolymers and combinations thereof.
8. The blended film of claim 6 , wherein at least one of the at least two chemically distinct block copolymers is a triblock terpolymer or at least two of the at least two structurally distinct block copolymers is a triblock terpolymer.
9. A device comprising one or more blended film of claim 6 .
10. The method of claim 1 , wherein the concentration of the at least two chemically distinct block copolymers in the deposition solution is 5 to 30% by weight.
11. The method of claim 1 , wherein the deposition solution further comprises a small molecule and the film further comprises the small molecule.
12. The method of claim 1 , wherein the at least two chemically distinct block copolymers are triblock copolymers.
13. The method of claim 12 , wherein a first chemically distinct block copolymer comprises an A block, a B block, and a C block and a second chemically distinct block copolymer comprises an A block, a B block, and a D block.
14. The method of claim 13 , wherein the C and D blocks are displayed on a surface of the pores of the blended film.