Multi-zone semiconductor substrate supports

1. A substrate support assembly comprising:

a top puck characterized by a first surface and a second surface opposite the first surface, wherein the top puck defines a thermal break between an interior zone and an exterior zone of the top puck, and wherein the thermal break comprises a trench defined about an interior radius of the top puck extending into the puck from the first surface of the top puck;

a backing plate coupled with the second surface of the top puck wherein the backing plate defines a recess vertically in line with the trench defined by the top puck;

a cooling plate coupled with the backing plate;

a heater coupled between the cooling plate and the backing plate; and

a back plate coupled with the backing plate about an exterior of the backing plate, wherein the back plate at least partially defines a volume, and wherein the heater and the cooling plate are housed within the volume.

2. The substrate support assembly of claim 1 , wherein the thermal break comprises a first trench defined about an interior radius of the top puck at the first surface of the top puck, and a second trench defined about a second interior radius of the top puck at the second surface of the top puck opposite the first surface.

3. The substrate support assembly of claim 2 , wherein at least one of the first trench and the second trench extends discontinuously about the top puck.

4. The substrate support assembly of claim 2 , wherein the recess defined in the backing plate comprises a first recess, and wherein the backing plate defines a second recess vertically in line with the second trench defined by the top puck.

5. The substrate support assembly of claim 4 , wherein the first recess defined in the backing plate extends partially through the backing plate, and wherein the second recess in the backing plate extends fully through the backing plate.

6. The substrate support assembly of claim 1 , wherein the cooling plate defines at least one channel within the cooling plate configured to distribute a fluid delivered from a central port in the cooling plate.

7. The substrate support assembly of claim 1 , wherein the heater comprises a first heater coupled with the backing plate at a first location, and a second heater coupled with the backing plate at a second location radially outward from the first location.

8. The substrate support assembly of claim 7 , wherein the cooling plate and the backing plate define a gap located radially between the first heater and the second heater, and wherein the second heater extends to a radial edge of a top surface of the cooling plate.

9. The substrate support assembly of claim 8 , wherein the first heater and the second heater are configured to operate independently of one another, and wherein the first heater and the second heater are configured to maintain temperature uniformity across a substrate on the substrate support assembly of +/−0.5° C.

10. The substrate support assembly of claim 1 , wherein the top puck comprises aluminum.

11. The substrate support assembly of claim 1 , wherein the heater comprises a polymer heater.

12. The substrate support assembly of claim 1 , wherein the top puck defines at least one recessed ledge about an exterior radius of the top puck.

13. The substrate support assembly of claim 12 , further comprising an edge ring extending about the top puck along the recessed ledge, wherein the edge ring extends vertically above a top plane of the top puck.

14. The substrate support assembly of claim 13 , wherein the edge ring is characterized by an outer diameter equal to an outer diameter of the top puck.

15. The substrate support assembly of claim 13 , wherein the top puck defines a plurality of recesses, and wherein the edge ring is configured to seat on ceramic pins located within the plurality of recesses.

16. The substrate support assembly of claim 15 , wherein the edge ring seats on the ceramic pins without contacting the top puck.

17. The substrate support assembly of claim 1 , wherein the volume is contained vertically between the back plate and the backing plate.

18. A substrate support assembly comprising:

a top puck, wherein the top puck is characterized by a first surface on which a substrate may be seated and a second surface opposite the first surface, and wherein a thermal break comprising a channel is defined extending from the second surface of the top puck without extending through the first surface of the top puck;

a backing plate coupled with the top puck, wherein the backing plate defines a recess within the backing plate, the recess within the backing plate vertically aligned with the channel defined in the top puck;

a back plate coupled with the backing plate about an exterior of the backing plate, wherein a volume is defined vertically between the back plate and the backing plate, and wherein the volume is defined radially by the back plate;

a cooling plate coupled with the backing plate; and

a heater coupled between the cooling plate and the backing plate, wherein the heater and the cooling plate are housed within the volume.

19. The substrate support assembly of claim 18 , wherein the backing plate contacts the top puck along a first surface of the backing plate, and wherein the backing plate contacts the heater along a second surface of the backing plate opposite the first surface of the backing plate.

20. The substrate support assembly of claim 18 , wherein the heater comprises a first heater, the substrate support assembly further comprising a second heater extending radially about the first heater, wherein a gap is defined between the first heater and the second heater, and wherein the second heater is housed within the volume.