Semiconductor device structure with resistive element

1. A semiconductor device structure, comprising:

a semiconductor substrate;

a gate stack over the semiconductor substrate;

an interconnect structure over the gate stack and the semiconductor substrate;

a resistive element over the interconnect structure, wherein the resistive element is positioned directly above the gate stack;

a thermal conductive element over the interconnect structure, wherein a direct projection of the thermal conductive element on a main surface of the resistive element extends across a portion of a first imaginary line and a portion of a second imaginary line of the main surface, the first imaginary line is perpendicular to the second imaginary line, and the first imaginary line and the second imaginary line intersect at a center of the main surface; and

a dielectric layer separating the thermal conductive element from the resistive element.

2. The semiconductor device structure as claimed in claim 1 , wherein there is no metal layer between the thermal conductive element and the resistive element.

3. The semiconductor device structure as claimed in claim 1 , wherein the thermal conductive element comprises a plurality of portions separated from each other.

4. The semiconductor device structure as claimed in claim 1 , wherein the thermal conductive element comprises:

a plurality of first portions, wherein each of the first portions extends along a first direction; and

at least one second portion intersecting at least some of the first portions.

5. The semiconductor device structure as claimed in claim 1 , wherein the direct projection of the thermal conductive element covers the center of the main surface of the resistive element.

6. The semiconductor device structure as claimed in claim 1 , wherein the thermal conductive element extends across a portion of an edge of the resistive element.

7. The semiconductor device structure as claimed in claim 1 , further comprising:

a second thermal conductive element, wherein the resistive element is between the second thermal conductive element and the thermal conductive element, a second direct projection of the second thermal conductive element on the main surface of the resistive element extends across a portion of the first imaginary line and a portion of the second imaginary line of the main surface; and

a second dielectric layer separating the second thermal conductive element from the resistive element.

8. The semiconductor device structure as claimed in claim 7 , wherein the direct projection of the thermal conductive element and the second direct projection of the second thermal conductive element on the main surface of the resistive element substantially overlap each other.

9. The semiconductor device structure as claimed in claim 7 , wherein a first vertical distance between the resistive element and the thermal conductive element is different from a second vertical distance between the resistive element and the second thermal conductive element.

10. The semiconductor device structure as claimed in claim 1 , wherein the resistive element comprises an array of resistive structures, and the resistive structures are electrically connected to each other.

11. The semiconductor device structure as claimed in claim 1 , wherein the resistive element is electrically connected to a transistor that is not directly under the resistive element, the transistor has a second gate stack, and the gate stack has a greater gate length than that of the second gate stack.

12. The semiconductor device structure as claimed in claim 1 , further comprising a second thermal conductive element, wherein the thermal conductive element is between the second thermal conductive element and the resistive element, a second direct projection of the second thermal conductive element on the main surface of the resistive element extends across a portion of the first imaginary line and a portion of the second imaginary line of the main surface.

13. The semiconductor device structure as claimed in claim 12 , further comprising a thermal conductive via between the thermal conductive element and the second thermal conductive element.

14. The semiconductor device structure as claimed in claim 13 , wherein the interconnect structure comprises a first conductive via and a second conductive via, the second conductive via is between the first conductive via and the thermal conductive via, and the second conductive via is substantially aligned with the first conductive via and the thermal conductive via.

15. A semiconductor device structure, comprising:

a semiconductor substrate;

an interconnect structure over the semiconductor substrate;

a resistive element over the interconnect structure;

a thermal conductive element over the interconnect structure, wherein a direct projection of the thermal conductive element on a main surface of the resistive element covers a center of the main surface, and the thermal conductive element is electrically isolated from the semiconductor substrate;

a dielectric layer between the thermal conductive element and the resistive element; and

a second thermal conductive element overlapped with the thermal conductive element, wherein the resistive element is between the thermal conductive element and the second thermal conductive element.

16. The semiconductor device structure as claimed in claim 15 , wherein the thermal conductive element comprises a metal mesh.

17. The semiconductor device structure as claimed in claim 15 , wherein the resistive element is electrically isolated from the thermal conductive element.

18. The semiconductor device structure as claimed in claim 15 , wherein the thermal conductive element is a heat dissipation element of the resistive element.

19. A method for forming a semiconductor device structure, comprising:

forming a gate stack and an interconnect structure over a semiconductor substrate;

forming a resistive element over the interconnect structure, wherein the resistive element is overlapped with the gate stack;

forming a thermal conductive element over the interconnect structure, wherein a direct projection of the thermal conductive element on a main surface of the resistive element extends across a portion of a first imaginary line and a portion of a second imaginary line of the main surface, the first imaginary line is perpendicular to the second imaginary line, and the first imaginary line and the second imaginary line intersect at a center of the main surface; and

forming a dielectric layer between the thermal conductive element and the resistive element.

20. The method for forming a semiconductor device structure as claimed in claim 19 , wherein the thermal conductive element is formed after the resistive element is formed.