Ultraviolet disinfection system
Embodiments of the invention include a disinfection chamber and a ultraviolet (UV) source. The UV source includes a semiconductor device and a sealed compartment. The semiconductor device includes an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The sealed compartment includes a support, on which the semiconductor device is disposed, a cap surrounding the semiconductor device, and a transparent window attached to the cap. The transparent window forms a wall of the disinfection chamber.
1 . A structure comprising:
a disinfection chamber; and
a ultraviolet (UV) source comprising:
a semiconductor device comprising an active layer disposed between an n-type region and a p-type region, wherein the active layer emits radiation having a peak wavelength in a UV range;
a sealed compartment comprising:
a support, wherein the semiconductor device is disposed on the support;
a cap surrounding the semiconductor device; and
a transparent window attached to the cap, the transparent window forming a wall of the disinfection chamber.
2 . The structure of claim 1 further comprising a lens disposed between the semiconductor device and the transparent window in the sealed compartment.
3 . The structure of claim 1 further comprising a compound parabolic collimator disposed between the semiconductor device and the transparent window in the sealed compartment.
4 . The structure of claim 1 wherein an inner surface of the disinfection chamber is made from food safe materials.
5 . The structure of claim 1 wherein the transparent window is shaped as a lens.
6 . The structure of claim 1 further comprising a sonication device for creating sound energy in the disinfection chamber.
7 . The structure of claim 1 wherein the disinfection chamber comprises first and second filters, wherein fluid enters the disinfection chamber through the first filter and exits the disinfection chamber through the second filter.
8 . The structure of claim 1 wherein an inner surface of the disinfection chamber comprises:
a smoothing layer;
a reflective layer, and
a protective layer.
9 . The structure of claim 8 wherein:
the smoothing layer is an oxide of aluminum;
the reflective layer is aluminum; and
the protective layer is an oxide of silicon.
10 . The structure of claim 1 wherein an end wall is removable from a remaining portion of the elongate chamber.