Photolithography method based on electronic beam

1. A photolithography method, the method comprising:

emitting an incident electron beam;

making the incident electron beam pass through a two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams;

shielding the transmission electron beam; and

radiating a surface of an object by the plurality of diffraction electron beams.

2. The method of claim 1 , wherein the two-dimensional nanomaterial comprises a single crystal graphene sheet.

3. The method of claim 1 , wherein the two-dimensional nanomaterial comprises a polycrystalline graphene sheet.

4. The method of claim 1 , wherein the two-dimensional nanomaterial comprises a single crystal MoS 2 sheet.

5. The method of claim 1 , wherein the making the incident electron beam pass through the two-dimensional nanomaterial comprises stacking the two-dimensional nanomaterial on a grid located on a metal sheet having a central through hole and covering the central through hole.

6. The method of claim 5 , wherein the grid is a copper mesh.

7. The method of claim 5 , wherein the grid is a carbon nanotube structure.

8. The method of claim 7 , wherein the carbon nanotube structure comprises two drawn carbon nanotube films stacked with each other.

9. The method of claim 1 , wherein the shielding the transmission electron beam comprises placing a conductor shield between the two-dimensional nanomaterial and the object, and connecting the conductor shield to an external circuit.

10. The method of claim 9 , wherein the shielding the transmission electron beam further comprises connecting the two-dimensional nanomaterial to the external circuit.

11. The method of claim 1 , further comprising shielding at lease one of the plurality of diffraction electron beams.

12. The method of claim 1 , wherein the radiating the surface of the object comprises forming a diffraction ring on the surface of the object, and the diffraction ring comprises a plurality of diffraction spots.

13. The method of claim 12 , wherein the radiating the surface of the object further comprises adjusting a pattern of the diffraction ring by changing the two-dimensional nanomaterial.

14. The method of claim 12 , wherein the radiating the surface of the object further comprises adjusting a radius R of the diffraction ring by changing a distance D between the two-dimensional nanomaterial and the object.

15. The method of claim 14 , wherein the changing the distance D between the two-dimensional nanomaterial and the object comprises calculating the distance D by a control computer according to formulas d sin θ≅dθ=λ and sin θ=R/(D 2 +R 2 ) 1/2 , where d represents a lattice period of the two-dimensional nanomaterial, λ represents a wavelength of the incident electron beam, and θ represents an angle between the transmission electron beam and the plurality of diffraction electron beams.

16. The method of claim 1 , wherein the radiating the surface of the object comprises scanning the surface of the object by the plurality of diffraction electron beams.

17. A photolithography method, the method comprising:

emitting an incident electron beam;

making the incident electron beam pass through a two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams;

shielding the transmission electron beam or at least one of the plurality of diffraction electron beams to form a work electron beam; and

radiating a surface of an object by the work electron beam.

18. A photolithography method, the method comprising:

emitting an incident electron beam;

making the incident electron beam pass through a two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; and

radiating a surface of an object by the transmission electron beam and the plurality of diffraction electron beams.