IP Library Granted Patent US 10,354,834
Granted Patent B2
US 10,354,834 · App. 15/617,157 · Granted Jul 16, 2019

X-ray analysis in air

Inventor: Peter J. Statham (High Wycombe, GB)
Assignee: Oxford Instruments Nanotechnology Tools Limited
H01J37/244H01J37/28H01J2237/164H01J2237/182H01J2237/188H01J2237/2445H01J2237/24415H01J2237/2608
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Quick Facts
Patent No.
US 10,354,834
App. No.
15/617,157
Granted
Jul 16, 2019
Kind
B2
Abstract

An x-ray analysis apparatus comprises an electron beam assembly for generating a focused electron beam within a first gas pressure environment. A sample assembly is used for retaining a sample within a second gas pressure environment such that the sample receives the electron beam from the electron beam assembly and such that the gas pressure in the second gas pressure environment is greater than the gas pressure within the first gas pressure environment. An x-ray detector is positioned so as to have at least one x-ray sensor element within the first gas pressure environment. The sensor element is mounted to a part of the electron beam assembly which is proximal to the sample assembly and further arranged in use to receive x-rays generated by the interaction between the electron beam and the sample.

Claims (34)

1. A module for detection of x-rays in an electron microscope that includes two or more sensor elements, wherein:

the sensor elements are distributed around the electron beam axis;

the module is removably mountable and positioned immediately below the polepiece, for the electron microscope for the final lens that the electron beam passes through before striking the specimen;

x-rays excited from the spot on a specimen beneath a focussed incident beam have clear line of sight to each sensor element so that the sensor elements subtend a large solid angle at the beam spot; and

a member containing an aperture between the sensor elements and a specimen provides a physical barrier arranged to prevent the specimen from impacting the sensor elements.

2. A module according to claim 1 , wherein for each sensor element a plane normal to the two dimensional surface which receives incident x-rays is substantially orthogonal to the axis of propagation of the electron beam.

3. A module according to claim 2 , wherein the specimen surface is arranged to be less than 0.1 mm from the aperture.

4. A module according to claim 3 , wherein the total solid angle subtended by a single sensor element at the point where the focussed electron beam strikes the specimen is greater than 0.2 steradians.

5. A module according to claim 3 , wherein each sensor element is a silicon drift detector (SDD).

6. A method of detection of x-rays, wherein the module of claim 3 is used in conjunction with an electron microscope that has a lens configuration where the specimen is immersed in a strong vertical magnetic field.

7. A module according to claim 2 , wherein the total solid angle subtended by a single sensor element at the point where the focussed electron beam strikes the specimen is greater than 0.2 steradians.

8. A module according to claim 6 , wherein each sensor element is a silicon drift detector (SDD).

9. A module according to claim 2 , wherein each sensor element is a silicon drift detector (SDD).

10. A method of detection of x-rays, wherein the module of claim 2 is used in conjunction with an electron microscope that has a lens configuration where the specimen is immersed in a strong vertical magnetic field.

11. A module according to claim 1 , wherein each sensor element is a silicon drift detector (SDD).

12. A method of detection of x-rays, wherein the module of claim 1 is used in conjunction with an electron microscope that has a lens configuration where the specimen is immersed in a strong vertical magnetic field.

13. A module for detection of x-rays in an electron microscope that includes two or more sensor elements, wherein:

the sensor elements are distributed around the electron beam axis;

the module is mounted within a polepiece, or to the end of the polepiece, or is positioned immediately below the polepiece, for the electron microscope for the final lens that the electron beam passes through before striking the specimen;

x-rays excited from the spot on a specimen beneath a focussed incident beam have clear line of sight to each sensor element so that the sensor elements subtend a large solid angle at the beam spot; and

a member containing an aperture between the sensor elements and a specimen provides a physical barrier arranged to prevent the specimen from impacting the sensor elements;

wherein the specimen surface is arranged to be less than 0.1 mm from the aperture.

14. A module according to claim 13 , wherein the total solid angle subtended by a single sensor element at the point where the focussed electron beam strikes the specimen is greater than 0.2 steradians.

15. A module according to claim 14 , wherein each sensor element is a silicon drift detector (SDD).

16. A module according to claim 13 , wherein each sensor element is a silicon drift detector (SDD).

17. A method of detection of x-rays, wherein the module of claim 13 is used in conjunction with an electron microscope that has a lens configuration where the specimen is immersed in a strong vertical magnetic field.

18. A module for detection of x-rays in an electron microscope that includes two or more sensor elements, wherein:

the sensor elements are distributed around the electron beam axis;

the module is mounted within a polepiece, or to the end of the polepiece, or is positioned immediately below the polepiece, for the electron microscope for the final lens that the electron beam passes through before striking the specimen;

x-rays excited from the spot on a specimen beneath a focussed incident beam have clear line of sight to each sensor element so that the sensor elements subtend a large solid angle at the beam spot; and

a member containing an aperture between the sensor elements and a specimen provides a physical barrier arranged to prevent the specimen from impacting the sensor elements;

wherein the total solid angle subtended by a single sensor element at the point where the focussed electron beam strikes the specimen is greater than 0.2 steradians.

19. A module according to claim 18 , wherein each sensor element is a silicon drift detector (SDD).

20. A method of detection of x-rays, wherein the module of claim 18 is used in conjunction with an electron microscope that has a lens configuration where the specimen is immersed in a strong vertical magnetic field.

Assignments (2)
CHANGE OF ADDRESS Recorded Jan 27, 2026
From: OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
To: OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
Reel/Frame 074456/0084 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 8, 2017
From: STATHAM, PETER
To: OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
Reel/Frame 042646/0152 →
Priority Claims (1)
GB 1317026.1 · Sep 25, 2013 · national
Continuity (2)
Continuation 15024773
Related Publication 20170271125A1 · Sep 21, 2017