Compositions and methods to affect skin irritation
Compositions are described that contain treated chitosan, modified chitosan and/or modified and treated chitosan for use in formulations for skin, hair and nails, and in compositions and methods of reducing topical agent-induced skin irritation and inflammation.
1. A method for reducing skin irritation and/or reducing skin inflammation and/or reducing irritant-induced IL-1α secretion induced by a topical agent comprising topically applying a composition comprising:
(a) an amount of at least one topical irritating agent that causes skin irritation and/or skin inflammation and/or IL-1α secretion, wherein the at least one topical irritating agent comprises a retinoid, a retinoid derivative, or a retinoid precursor, wherein the retinoid, retinoid derivative and the retinoid precursor are selected from the group consisting of retinol, retinal, retinyl esters, tretinoin, retinoic acid, Vitamin A, an ester of Vitamin A, isotretinoin, alitertinoin, etretinate, acitretin, adapalene, bexarotene, and tazarotene, and combinations thereof; and
(b) an amount of at least one chitosan covalently modified with octane sulfonic acid via a sulfonamide linkage.
2. The method of claim 1 , wherein the retinoid, retinoid derivative, or retinoid precursor comprises about 0.001-5% W/V of the total weight of the composition.
3. The method of claim 1 , wherein said at least one chitosan covalently modified with octane sulfonic acid via a sulfonamide linkage comprises about 0.0001-5% W/V of the total weight of the composition.
4. The method of claim 1 , wherein the at least one topical irritating agent is retinol.
5. The method of claim 1 , wherein the ester of Vitamin A is retinol palmitate.
6. The method of claim 1 , wherein the composition is applied to skin.
7. The method of claim 1 , wherein the composition is topically applied to a human.