IP Library › Granted Patent US 10,181,480
Granted Patent B2
US 10,181,480 · App. 15/631,294 · Granted Jan 15, 2019

Thin film transistor substrate and display apparatus

Inventors: Sangho Park (Yongin-si, KR); Gyungsoon Park (Yongin-si, KR); Heerim Song (Yongin-si, KR); Donghwan Shim (Yongin-si, KR); Jungkyu Lee (Yongin-si, KR); Seunghwan Cho (Yongin-si, KR); Jonghyun Choi (Yongin-si, KR)
Assignee: SAMSUNG DISPLAY CO., LTD.
H01L27/1222G09G3/3233H01L27/3262H01L27/3265H01L27/3276G09G2300/043G09G2300/0842G09G2300/0861G09G2310/0251G09G2310/0262G09G2320/0233G09G2320/043G09G2330/023
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Quick Facts
Patent No.
US 10,181,480
App. No.
15/631,294
Granted
Jan 15, 2019
Kind
B2
Abstract

A thin film transistor “TFT”) substrate includes a substrate, an active layer over the substrate, and first and second TFTs over the substrate. The active layer includes: a first drain region, a first channel region and a first source region, which function as a drain, a channel and a source of the first TFT: a first lightly doped region between the first drain region and the first channel region: a second lightly doped region between the first channel region and the first source region: and a second drain region, a second channel region and a second source region, which function as a drain, a channel and a source of the second TFT. An impurity concentration at the second drain or source region is lower than an impurity concentration at the first drain or source region and higher than an impurity concentration at the first or second channel region.

Claims (65)

1. A thin film transistor substrate comprising:

a substrate;

an active layer over the substrate;

a first thin film transistor over the substrate; and

a second thin film transistor over the substrate,

wherein the active layer comprises:

a first drain region, a first channel region and a first source region, which function as a drain, a channel and a source of the first thin film transistor, respectively;

a first lightly doped region between the first drain region and the first channel region;

a second lightly doped region between the first channel region and the first source region; and

a second drain region, a second channel region and a second source region, which function as a drain, a channel and a source of the second thin film transistor, respectively,

wherein an impurity concentration at the second drain region and the second source region is lower than an impurity concentration at the first drain region and the first source region, and higher than an impurity concentration at the first channel region and the second channel region.

2. The thin film transistor substrate of claim 1 , wherein the impurity concentration at the second drain region and the second source region is substantially equal to an impurity concentration at the first lightly doped region and the second lightly doped region.

3. The thin film transistor substrate of claim 1 , wherein

each of the first drain region and the first source region has a first impurity concentration,

each of the first lightly doped region, the second lightly doped region, the second drain region and the second source region has a second impurity concentration, which is lower than the first impurity concentration, and

each of the first channel region and the second channel region has a third impurity concentration, which is lower than the second impurity concentration.

4. The thin film transistor substrate of claim 1 , wherein a channel length of the second channel region is greater than a channel length of the first channel region.

5. The thin film transistor substrate of claim 1 , wherein a length of the second source region is greater than twice a length of the second lightly doped region.

6. The thin film transistor substrate of claim 1 , wherein a length of the second source region is greater than half a channel width of the second channel region.

7. The thin film transistor substrate of claim 1 , wherein a length of the second source region is greater than about 1 micrometer.

8. The thin film transistor substrate of claim 1 , wherein the second channel region is directly connected between the second drain region and the second source region.

9. The thin film transistor substrate of claim 1 , wherein

the active layer further comprises a wiring region directly connected to at least one of the second drain region and the second source region, and

an impurity concentration at the wiring region is substantially equal to an impurity concentration at the first drain region and the first source region.

10. The thin film transistor substrate of claim 1 , wherein a conductive type of the first and second TFTs is n-type.

11. A display apparatus comprising:

a substrate;

pixels arranged over the substrate, wherein each of the pixels comprises a first thin film transistor, a second thin film transistor and a display element; and

an active layer disposed over the substrate, wherein the active layer comprises a first drain region, a first lightly doped region, a first channel region, a second lightly doped region and a first source region,

wherein the first thin film transistor comprises the first drain region, the first lightly doped region, the first channel region, the second lightly doped region and the first source region, which are continuously arranged along a lengthwise direction thereof,

the second thin film transistor comprises a second drain region, a second channel region and a second source region, which are continuously arranged along a lengthwise direction thereof, and

an impurity concentration at the second drain region and the second source region is substantially equal to an impurity concentration at the first lightly doped region and the second lightly doped region.

12. The display apparatus of claim 11 , wherein

each of the first drain region and the first source region has a first impurity concentration,

each of the first lightly doped region, the second lightly doped region, the second drain region and the second source region has a second impurity concentration, which is lower than the first impurity concentration, and

each of the first channel region and the second channel region has a third impurity concentration, which is lower than the second impurity concentration.

13. The display apparatus of claim 12 , wherein

the active layer further comprises a wiring region directly connected to at least one of the second drain region and the second source region, and

the wiring region has the first impurity concentration.

14. The display apparatus of claim 11 , wherein an area of the second drain region or the second source region is greater than twice an area of the first lightly doped region or the second lightly doped region.

15. The display apparatus of claim 11 , wherein

the second thin film transistor generates a driving current corresponding to a voltage between a gate electrode overlapping with the second channel region and the second source region, and

the second thin film transistor outputs the driving current to a pixel electrode.

16. The display apparatus of claim 11 , wherein a channel length of the second TFT is greater than twice a channel length of the first thin film transistor.

17. The display apparatus of claim 11 , further comprising:

a gate line over the substrate; and

a data line over the substrate,

wherein a part of the gate line overlaps with the first channel region to function as a gate electrode of the first thin film transistor, and

the data line is connected to the first source region.

18. The display apparatus of claim 11 , further comprising:

first to third gate lines which transfer a scan signal, a first control signal and a second control signal, respectively; and

a data line which transfers a data signal, and

each of the pixels comprises:

a driving transistor including a gate electrode connected to a first node, a drain connected to a second node, and a source connected to a third node;

a storage capacitor connected between the first node and a fourth node;

a switching transistor which transfers the data signal to the fourth node in response to the scan signal;

an initialization transistor which transfers an initialization voltage to the third node in response to the scan signal;

a compensation transistor which connects the first node to the second node in response to the scan signal;

a first control transistor which connects the third node to the fourth node in response to the first control signal;

a second control transistor which applies a first driving voltage to the second node in response to the second control signal; and

the display element having an anode connected to the third node and a cathode to which a second driving voltage is applied.

19. The display apparatus of claim 18 , wherein

the second thin film transistor is the driving transistor, and

the first thin film transistor is at least one of the switching transistor, the initialization transistor, the compensation transistor, the first control transistor and the second control transistor.

20. The display apparatus of claim 11 , wherein a conductive type of the first and second thin film transistor is n-type.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 23, 2017
From: PARK, SANGHO; PARK, GYUNGSOON; SONG, HEERIM; SHIM, DONGHWAN; LEE, JUNGKYU; CHO, SEUNGHWAN; CHOI, JONGHYUN
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 042795/0976 →
Priority Claims (1)
KR 10-2016-0079279 · Jun 24, 2016 · national
Continuity (1)
Related Publication 20170373094A1 · Dec 28, 2017