Ion beam system
Provided is an ion beam system including a gas field ionization ion source which can obtain a high current sufficient for processing and stabilize an ion beam current. The ion beam system includes a gas field ionization ion source which includes: a vacuum vessel; an emitter tip holder disposed in the vacuum vessel; an emitter tip connected to the emitter tip holder; an extraction electrode opposed to the emitter tip; a gas supply portion for supplying a gas to the emitter tip; and a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder. The cold transfer member has its surface covered with a heat insulating material in order to prevent the gas condensation.
1. An ion beam system comprising:
a gas field ionization ion source which includes:
a vacuum vessel;
an emitter tip holder disposed in the vacuum vessel;
an emitter tip connected to the emitter tip holder;
an extraction electrode opposed to the emitter tip;
a gas supply portion for supplying a gas to the emitter tip; and
a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder,
wherein a heat insulating material covers an outer surface of the cold transfer member in order to prevent condensation of the gas.
2. The ion beam system according to claim 1 ,
wherein the cold transfer member is a metal thin film or a braided metal wire and has a heat insulating layer adhered to the surface thereof.
3. The ion beam system according to claim 1 ,
wherein the cold transfer member comprises a metal and the heat insulating material comprises a fluorine resin or ceramics.
4. The ion beam system according to claim 1 ,
wherein the gas is a gas containing any one of neon, argon, krypton and xenon.
5. The ion beam system according to claim 1 ,
wherein the gas is a gas containing any one of carbon monoxide, oxygen and nitrogen.
6. The ion beam system according to claim 1 ,
wherein the gas supply portion supplies a gas mixture of krypton gas and other gas or supplies the krypton gas and the other gas by switching between these gases, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 60K.
7. The ion beam system according to claim 1 ,
wherein the gas supply portion supplies a gas mixture of argon gas and helium gas or a gas mixture of argon gas and hydrogen gas, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 45K.
8. An ion beam system comprising:
a gas field ionization ion source which includes:
a vacuum vessel;
an emitter tip holder disposed in the vacuum vessel;
an emitter tip connected to the emitter tip holder;
an extraction electrode opposed to the emitter tip;
a gas supply portion for supplying a gas to the emitter tip; and
a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder,
the system further comprising:
an adhesion member covering an outer surface of the cold transfer member; and
a heat insulating material adhered to the outer surface of the cold transfer member via the adhesion member, and covering the adhesion member.
9. The ion beam system according to claim 8 ,
wherein the cold transfer member is a metal thin film or a braided metal wire and has a heat insulating layer adhered to the surface thereof.
10. The ion beam system according to claim 8 ,
wherein the cold transfer member comprises a metal and the heat insulating material comprises a fluorine resin or ceramics.
11. The ion beam system according to claim 8 ,
wherein the gas is a gas containing any one of neon, argon, krypton and xenon.
12. The ion beam system according to claim 8 ,
wherein the gas is a gas containing any one of carbon monoxide, oxygen and nitrogen.
13. The ion beam system according to claim 8 ,
wherein the gas supply portion supplies a gas mixture of krypton gas and other gas or supplies the krypton gas and the other gas by switching between these gases, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 60K.
14. The ion beam system according to claim 8 ,
wherein the gas supply portion supplies a gas mixture of argon gas and helium gas or a gas mixture of argon gas and hydrogen gas, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 45K.
15. An ion beam system comprising:
a gas field ionization ion source which includes:
a vacuum vessel; an emitter tip holder disposed in the vacuum vessel;
an emitter tip connected to the emitter tip holder;
an extraction electrode opposed to the emitter tip;
a gas supply portion for supplying a gas to the emitter tip; and
a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder,
the system further comprising:
a heat insulating material covering an outer surface of the cold transfer member;
a metal material covering an outer surface of the heat insulating material; and
a heating mechanism for heating the metal material.