Apparatus and method for cleaning wafer handling equipment
A cleaning assembly for cleaning one or more wafer edge handling contact surfaces of wafer handling equipment includes a substrate and a cleaning ring. The substrate includes an edge portion that extends about the body of the substrate. The cleaning ring is reversibly attachable to the edge portion of the substrate. The cleaning ring is formed from a deformable material. The substrate and cleaning ring are sized for compatibility with a front opening unified pod (FOUP) or a wafer cassette of a semiconductor fabrication facility.
1. An apparatus comprising:
a substrate, the substrate including a notched external edge encircling an outside circumference of the substrate; and
a cleaning ring, the cleaning ring including a notched internal edge encircling an inside circumference of the cleaning ring, wherein the notched internal edge of the cleaning ring is shaped to fit to the notched external edge of the substrate, wherein the cleaning ring is reversibly attached to the substrate via the notched external edge of the substrate and the notched internal edge of the cleaning ring, wherein the cleaning ring is formed from a deformable material, wherein the cleaning ring includes a notched external edge including a horizontal surface and a vertical surface, wherein the horizontal surface extends outward from the vertical surface.
2. The apparatus of claim 1 , wherein the deformable material of the cleaning ring is coated with an adhesive material.
3. The apparatus of claim 1 , wherein the substrate has a ring shape.
4. The apparatus of claim 3 , wherein the substrate includes a plurality of spokes.
5. The apparatus of claim 1 , wherein the substrate has a disk shape.
6. The apparatus of claim 1 , wherein the notched internal edge of the cleaning ring corresponds with the notched external edge of the substrate such that a bottom surface of the cleaning ring is flush with a bottom surface of the substrate when the cleaning ring is attached to the substrate.
7. The apparatus of claim 1 , wherein the substrate and cleaning ring are sized for compatibility with at least one of a front opening unified pod (FOUP) or wafer cassette of a semiconductor fabrication facility.
8. The apparatus of claim 1 , further comprising:
an actuator disposed on the substrate, wherein the actuator is configured to produce vibrations within the substrate such that the cleaning ring is actuated at least partially in at least one of a horizontal or vertical direction.
9. The apparatus of claim 1 , further comprising:
a heater disposed on the substrate, wherein the heater is configured to heat at least an edge portion of the substrate.
10. The apparatus of claim 1 , wherein the substrate includes one or more manifolds in an edge portion of the substrate to provide airflow at the edge portion of the substrate.
11. A system comprising:
a front opening unified pod device; and
a substrate, the substrate including a notched external edge encircling an outside circumference of the substrate, wherein the substrate is configured to receive a cleaning ring, the cleaning ring including a notched internal edge encircling an inside circumference of the cleaning ring, wherein the notched internal edge of the cleaning ring is shaped to fit to the notched external edge of the substrate, wherein the cleaning ring is reversibly attachable to the substrate via the notched external edge of the substrate and the notched internal edge of the cleaning ring, wherein the cleaning ring is formed from a deformable material, wherein the cleaning ring includes a notched external edge including a horizontal surface and a vertical surface, wherein the horizontal surface extends outward from the vertical surface,
wherein the substrate is positionable within the front opening unified pod device.
12. The system of claim 11 , wherein the deformable material of the cleaning ring is coated with an adhesive material.
13. The system of claim 11 , wherein the substrate has a ring shape.
14. The system of claim 13 , wherein the substrate includes a plurality of spokes.
15. The system of claim 11 , wherein the substrate has a disk shape.
16. The system of claim 11 , wherein the notched internal edge of the cleaning ring corresponds with the notched external edge of the substrate such that a bottom surface of the cleaning ring is flush with a bottom surface of the substrate when the cleaning ring is attached to the substrate.
17. The system of claim 11 , wherein the substrate and cleaning ring are sized for compatibility with at least one of the front opening unified pod device or a wafer cassette of a semiconductor fabrication facility.
18. The system of claim 11 , further comprising:
an actuator disposed on the substrate, wherein the actuator is configured to produce vibrations within the substrate such that the cleaning ring is actuated at least partially in at least one of a horizontal or vertical direction.
19. The system of claim 11 , further comprising:
a heater disposed on the substrate, wherein the heater is configured to heat at least an edge portion of the substrate.
20. The system of claim 11 , wherein the substrate includes one or more manifolds in an edge portion of the substrate to provide airflow at the edge portion of the substrate.