Substrate holder and method of manufacturing a substrate holder
An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
1. An object holder comprising:
a main body having a first external surface and a second external surface opposite the first surface;
a heat transfer structure located between the first and second surfaces, the heat transfer structure arranged to allow active transfer of heat with at least the main body;
a plurality of burls provided at the first surface and having end surfaces to contact an object; and
a heater, in addition to the heat transfer structure, attached to the main body at an external surface of the main body other than the first surface,
wherein the burls comprise a composite material that comprises (i) a particulate component comprising diamond particulate and (ii) a matrix component having the particulate component therein, wherein the main body is made of the composite material.
2. The object holder of claim 1 , wherein the object holder is constructed and arranged to support, as the object, at least one selected from: a substrate, a patterning device, a sensor, and/or an optical element.
3. A lithographic apparatus, comprising:
a support structure configured to support a patterning device;
a projection system arranged to project a beam patterned by the patterning device onto a substrate; and
the object holder according to claim 1 , wherein the object is the substrate.
4. The object holder of claim 1 , wherein the diamond particulate is arranged to contact the object.
5. The object holder of claim 1 , selected from the group consisting of a vacuum object holder, an electrostatic object holder, and a substrate arm.
6. The object holder of claim 1 , wherein the matrix component comprises elemental silicon and silicon carbide.
7. The object holder of claim 1 , wherein the matrix component comprises silicon carbide.
8. The object holder of claim 1 , wherein the particulate component further comprises at least one phase other than diamond.
9. The object holder of claim 8 , wherein the at least one phase other than diamond comprises SiC.
10. The object holder of claim 1 , wherein the main body or another part of the burls comprises a different material than the composite material, and the different material contacts the composite material of the burls.
11. The object holder of claim 1 , wherein the main body comprises SiSiC and further comprising burls at the second surface.
12. The object holder of claim 1 , further comprising one or more protrusions of a different height than that of the burls.
13. The object holder of claim 1 , wherein the composite material is at the second surface.
14. A semiconductor substrate handling article comprising:
a body having a first external surface and a second external surface opposite to the first surface;
a heat transfer structure located between the first and second surfaces, the heat transfer structure arranged to allow active transfer of heat with at least the body;
an electric or electrical component on an external surface of the body that is other than the first surface; and
a composite material, at the first surface, that comprises (i) a particulate component comprising diamond particulate and (ii) a matrix component having the particulate component therein, wherein the body is made of the composite material and the diamond particulate at the first surface is arranged to contact a semiconductor substrate.
15. The article of claim 14 , selected from the group consisting of a vacuum substrate holder, an electrostatic holder, a vacuum substrate table, and a substrate arm.
16. The article of claim 14 , wherein the matrix component comprises elemental silicon and silicon carbide.
17. The article of claim 14 , wherein the matrix component comprises silicon carbide.
18. The article of claim 14 , wherein the first surface of the article comprises a plurality of burls to minimize substrate contact area.
19. The article of claim 14 , wherein the particulate component further comprises at least one phase other than diamond.
20. The article of claim 19 , wherein the at least one phase other than diamond comprises SiC.
21. The article of claim 14 , wherein a portion of the article at the first surface is configured to contact the semiconductor substrate and the article comprises a different material than the composite material, the different material contacts the composite material of the portion.
22. The article of claim 14 , wherein the body comprises SiSiC and further comprising burls at the second surface.
23. The article of claim 14 , wherein the body has protrusions of different heights.
24. The article of claim 14 , wherein the composite material is at the second surface.
25. A substrate handling article comprising:
a first portion thereof configured to contact a substrate at a first side of the article, the first portion comprising a composite material that comprises diamond particulate distributed throughout a matrix,
a second portion thereof at a second side of the article that is opposite the first side,
a body portion made of the composite material located between the first and second portions, the body portion configured to have an electric or electrical component on an external surface of the body portion that is other than at the first side, and
a heat transfer structure located between the first and second portions, the heat transfer structure arranged to allow active transfer of heat with at least the body portion.
26. The article of claim 25 , wherein the body portion comprises SiSiC and the second portion comprises burls at the second side.
27. The article of claim 25 , wherein the body portion has protrusions of different heights.
28. The article of claim 25 , wherein the second portion comprises the composite material.
29. A method of manufacturing a semiconductor substrate handling article, the method comprising:
providing a body for the article, the body comprising a first external surface at which a substrate is held and a second external surface opposite to the first surface and comprising a composite material, at the first surface, that comprises (i) a particulate component comprising diamond particulate and (ii) a matrix component having the particulate component therein, wherein the body is made of the composite material; and
removing at least part of the composite material of the body by grinding or polishing with an abrasive to shape a protrusion, having the composite material, to contact the substrate,
wherein the body comprises a heat transfer structure located between the first and second surfaces, the heat transfer structure arranged to allow active transfer of heat with at least the body, and
wherein the body has an electric or electrical component attached to an external surface of the main body at other than the first surface.
30. The method of claim 29 , wherein the composite material is in the form of a plurality of burls of the body and the removing is of the tops of the plurality of burls.
31. The method of claim 29 , wherein the diamond particulate is arranged to contact the substrate.
32. The method of claim 29 , wherein the matrix component comprises elemental silicon and silicon carbide.
33. The method of claim 29 , wherein the body comprises a different material than the composite material, and the different material contacts the composite material.