IP Library Granted Patent US 10,134,969
Granted Patent B2
US 10,134,969 · App. 15/658,202 · Granted Nov 20, 2018

Vertical solid-state transducers and high voltage solid-state transducers having buried contacts and associated systems and methods

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Quick Facts
Patent No.
US 10,134,969
App. No.
15/658,202
Granted
Nov 20, 2018
Kind
B2
Abstract

Solid-state transducers (“SSTs”) and vertical high voltage SSTs having buried contacts are disclosed herein. An SST die in accordance with a particular embodiment can include a transducer structure having a first semiconductor material at a first side of the transducer structure, and a second semiconductor material at a second side of the transducer structure. The SST can further include a plurality of first contacts at the first side and electrically coupled to the first semiconductor material, and a plurality of second contacts extending from the first side to the second semiconductor material and electrically coupled to the second semiconductor material. An interconnect can be formed between at least one first contact and one second contact. The interconnects can be covered with a plurality of package materials.

Claims (28)

1. A solid-state transducer (SST) die, comprising:

a transducer structure having a first semiconductor material on a first side and a second semiconductor material on a second side, wherein the transducer structure is separated into at least first and second electrically isolated junctions;

a first contact electrically coupled to the first semiconductor material at the first junction;

a second contact electrically coupled to the second semiconductor material at the second junction, wherein the second contact extends through the first semiconductor material and is electrically isolated from the first semiconductor material;

an interconnect formed between the first contact and the second contact such that the first and second junctions are electrically connected in series; and

a third contact connected to the interconnect, the third contact configured to cross-connect to another contact on a second SST die.

2. The SST die of claim 1 wherein the second contact extends through a channel formed through the first semiconductor material.

3. The SST die of claim 2 , further comprising a light-emitting active material disposed between the first semiconductor material and the second semiconductor material, and wherein the second contact extends through the channel formed through the first semiconductor material and through the light-emitting active material.

4. The SST die of claim 2 , wherein the channel is lined with a dielectric material to electrically insulate the second contact from the first semiconductor material.

5. The SST die of claim 1 , further comprising a dielectric material between the interconnect and the first semiconductor material and a plurality of package materials covering the interconnect.

6. The SST die of claim 1 wherein the first contact and the second contact are buried, and wherein the SST die further comprises a first external terminal and a second external terminal, and wherein the first and second external terminals are configured to connect to a power source.

7. The SST die of claim 1 wherein the transducer structure is a vertical transducer structure having the first contact and second contact at the first side, and wherein the SST die is configured to directly attach to an external component.

8. The SST die of claim 1 wherein each junction comprises an individually addressable light-emitting diode (LED) die.

9. The SST die of claim 1 , further comprising a thermal pad disposed on the first side.

10. The SST die of claim 1 , further comprising a dielectric material over the first contact, the dielectric material having a plurality of openings that are aligned with the first and second contacts.

11. A light-emitting diode (LED) comprising:

a light-emitting transducer structure having a light-emitting active region positioned between a first semiconductor material and a second semiconductor material, the transducer structure separated into at least first and second electrically isolated junctions;

a first contact electrically coupled to the first semiconductor material at the first junction;

a second contact electrically coupled to the second semiconductor material at the second junction, wherein the second contact extends through the first semiconductor material and is electrically isolated from the first semiconductor material;

an interconnect formed between the first contact and the second contact such that the first and second junctions are electrically connected in series; and

a third contact connected to the interconnect, the third contact configured to cross-connect to another contact on a second LED.

12. The LED of claim 11 wherein the second contact extends through the light-emitting active region.

13. The LED of claim 12 wherein the second contact extends through a channel formed through the first semiconductor material and the light-emitting active region.

14. The LED of claim 12 wherein the channel is lined with a dielectric material to electrically insulate the second contact from the first semiconductor material.

15. The LED of claim 11 , further comprising a passivation material over the interconnect such that the interconnect is encased in the passivation material.

16. The LED of claim 11 , further comprising a plurality of package materials over the passivation material and the interconnect.

17. The LED of claim 11 , further comprising a thermal pad on the first side.

18. The LED of claim 11 , further comprising a dielectric material over the first contact, the dielectric material having a plurality of openings that are aligned with the first and second contacts.

Assignments (7)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050709/0838 →
RELEASE OF SECURITY INTEREST Recorded Jul 20, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 046597/0333 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2018
From: ODNOBLYUDOV, VLADIMIR; SCHUBERT, MARTIN F.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 045435/0911 →
SUPPLEMENT NO. 6 TO PATENT SECURITY AGREEMENT Recorded Nov 1, 2017
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 044653/0333 →
SUPPLEMENT NO. 6 TO PATENT SECURITY AGREEMENT Recorded Nov 1, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 044348/0253 →
Cited By (2)
US 12,206,046 US 12,279,468