IP Library Granted Patent US 10,453,762
Granted Patent B2
US 10,453,762 · App. 15/662,769 · Granted Oct 22, 2019

Shielded fan-out packaged semiconductor device and method of manufacturing

Inventors: Fumitomo Watanabe (Akita, JP); Keiyo Kusanagi (Akita, JP)
Assignee: Micron Technology, Inc.
H01L23/3107H01L21/561H01L21/568H01L21/6835H01L23/3114H01L23/3171H01L23/3185H01L23/552H01L23/60H01L24/19H01L23/3128H01L24/16H01L24/32H01L24/73H01L24/81H01L24/92H01L25/0655H01L2221/68345H01L2221/68359H01L2224/0401H01L2224/16227H01L2224/32225H01L2224/73204H01L2224/81005H01L2224/92125H01L2224/97H01L2924/014H01L2924/01015H01L2924/01082H01L2924/14H01L2924/1431H01L2924/1434H01L2924/15192H01L2924/15311H01L2924/15331H01L2924/3025
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Quick Facts
Patent No.
US 10,453,762
App. No.
15/662,769
Granted
Oct 22, 2019
Kind
B2
Abstract

Several aspects of the present technology are directed toward fan-out packaged semiconductor devices having an integrated shield to protect against electromagnetic interference and methods of manufacturing such devices. The shield can be constructed by forming a conductive wall on a redistribution structure and disposing a conductive cap on an upper surface of an encapsulant. The conductive wall and the conductive cap are electrically connected to each other. By forming the conductive wall directly on the redistribution structure and separately disposing the conductive cap onto an upper surface of the encapsulant, an electromagnetic shield can be readily formed using wafer-level or panel-level processing techniques that are efficient and cost-effective. Several embodiments of semiconductor devices in accordance with the present technology accordingly shield the integrated circuitry of semiconductor dies from electromagnetic interference.

Claims (10)

1. A method of packaging a semiconductor device, comprising:

electrically coupling a semiconductor die to die contacts at a first side of a redistribution structure, wherein the die contacts are electrically coupled to ball pads at a second side of the redistribution structure;

forming a conductive wall on the first side of the redistribution structure by printing a conductive material or reflowing a conductive paste, wherein the conductive wall is electrically coupled to at least one shield contact at the first side of the redistribution structure, and wherein the shield contact is electrically coupled to a ball pad at the second side of the redistribution structure;

depositing an encapsulant over the semiconductor die, wherein the encapsulant has an upper surface;

removing a portion of the encapsulant and a portion of the conductive wall to form the upper surface on the encapsulant over the semiconductor die and a top surface on the conductive wall, wherein the upper surface of the encapsulant and the top surface of the conductive wall are coplanar; and

disposing a conductive cap onto the upper surface of the encapsulant, wherein the conductive cap is electrically coupled to the conductive wall.

2. The method of claim 1 wherein depositing the encapsulant comprises covering a backside of the semiconductor die with the encapsulant.

3. The method of claim 2 wherein disposing the conductive cap onto the upper surface of the encapsulant comprises adhering a metal plate to the upper surface of the encapsulant and the top surface of the conductive wall.

4. The method of claim 2 wherein disposing the conductive cap onto the upper surface of the encapsulant comprises depositing at least one layer of a conductive material onto the surface of the encapsulant and directly onto the top surface of the conductive wall.

5. The method of claim 2 wherein the redistribution structure comprises a multi-level shield structure, and wherein the method further comprises forming a shield component in the multi-level shield structure that is electrically coupled to the conductive wall and the conductive cap.

Assignments (7)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050709/0838 →
RELEASE OF SECURITY INTEREST Recorded Jul 20, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 046597/0333 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
SUPPLEMENT NO. 6 TO PATENT SECURITY AGREEMENT Recorded Nov 1, 2017
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 044653/0333 →
SUPPLEMENT NO. 6 TO PATENT SECURITY AGREEMENT Recorded Nov 1, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 044348/0253 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 28, 2017
From: WATANABE, FUMITOMO; KUSANAGI, KEIYO
To: MICRON TECHNOLOGY, INC.
Reel/Frame 043127/0569 →
Continuity (1)
Related Publication 20190035706A1 · Jan 31, 2019