Piezoelectric thin film resonator, filter, and multiplexer
A piezoelectric thin film resonator includes: a substrate; a piezoelectric film located on the substrate; a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and a wiring layer located on the upper electrode, the wiring layer having a thickness equal to or greater than 0.8 μm and equal to or less than 3.0 μm, at least a part of the wiring layer overlapping in plan view with a resonance region in which the lower electrode and the upper electrode face each other across the piezoelectric film, a distance between an outline of the resonance region and an edge of a lower surface located within the resonance region and farthest from the outline being greater than 0 μm and less than 2 μm.
1. A piezoelectric thin film resonator comprising:
a substrate;
a piezoelectric film located on the substrate;
a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and
a wiring layer located on the upper electrode, the wiring layer having a thickness equal to or greater than 0.8 μm and equal to or less than 3.0 μm, at least a part of the wiring layer overlapping in plan view with a resonance region defined by a region where the lower electrode and the upper electrode face each other across the piezoelectric film, a distance between an outline of the resonance region and an edge of a lower surface of the wiring layer located within the resonance region and farthest from the outline being greater than 0 μm and equal to or less than 1.5 μm,
wherein:
the wiring layer is located from an extraction region, to which the upper electrode is extracted from the resonance region, to the resonance region,
the piezoelectric film is an aluminum nitride film, and
the wiring layer includes a gold layer having a thickness equal to or greater than 0.8 μm and equal to or less than 3.0 μm.
2. The piezoelectric thin film resonator according to claim 1 , wherein
the wiring layer includes an adhesion layer located on the upper electrode, and a low-resistivity layer located on the adhesion layer and being the gold layer.
3. The piezoelectric thin film resonator according to claim 1 , wherein
the low-resistivity layer has a thickness equal to or greater than 1.0 μm and equal to or less than 2.5 μm, and
the distance is equal to or greater than 0.5 μm and equal to or less than 1.5 μm.
4. The piezoelectric thin film resonator according to claim 1 , wherein
the wiring layer has a region that overlaps with the resonance region so that the distance between the outline and the edge of the lower surface is substantially constant.
5. A filter comprising:
a piezoelectric thin film resonator including:
a substrate;
a piezoelectric film located on the substrate;
a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and
a wiring layer located on the upper electrode, the wiring layer having a thickness equal to or greater than 0.8 μm and equal to or less than 3.0 μm, at least a part of the wiring layer overlapping in plan view with a resonance region defined by a region where the lower electrode and the upper electrode face each other across the piezoelectric film, a distance between an outline of the resonance region and an edge of a lower surface located within the resonance region and farthest from the outline being greater than 0 μm and equal to or less than 1.5 μm,
wherein:
the wiring layer is located from an extraction region, to which the upper electrode is extracted from the resonance region, to the resonance region,
the piezoelectric film is an aluminum nitride film, and
the wiring layer includes a gold layer having a thickness equal to or greater than 0.8 μm and equal to or less than 3.0 μm.
6. A multiplexer comprising:
a filter including a piezoelectric thin film resonator, wherein
the piezoelectric thin film resonator includes:
a substrate;
a piezoelectric film located on the substrate;
a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and
a wiring layer located on the upper electrode, the wiring layer having a thickness equal to or greater than 0.8 μm and equal to or less than 3.0 μm, at least a part of the wiring layer overlapping in plan view with a resonance region defined by a region where the lower electrode and the upper electrode face each other across the piezoelectric film, a distance between an outline of the resonance region and an edge of a lower surface located within the resonance region and farthest from the outline being greater than 0 μm and equal to or less than 1.5 μm,
wherein:
the wiring layer is located from an extraction region, to which the upper electrode is extracted from the resonance region, to the resonance region,
the piezoelectric film is an aluminum nitride film, and
the wiring layer includes a gold layer having a thickness equal to or greater than 0.8 μm and equal to or less than 3.0 μm.