IP Library Granted Patent US 10,267,745
Granted Patent B2
US 10,267,745 · App. 15/673,582 · Granted Apr 23, 2019

Defect detection method and defect detection device and defect observation device provided with same

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Quick Facts
Patent No.
US 10,267,745
App. No.
15/673,582
Granted
Apr 23, 2019
Kind
B2
Abstract

The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

Claims (25)

1. An inspection device, comprising:

an illumination optical system configured to emit light onto a surface of a sample;

a detection optical system configured to detect scattered light from the sample caused by the illumination optical system;

a first filter disposed near a pupil plane of the detection optical system, the first filter having a plurality of regions of different transmission characteristics regarding the scattered light;

a second filter disposed near the pupil plane of the detection optical system, the second filter having a plurality of regions with different polarization characteristics regarding the scattered light; and

a sensor configured to detect scattered light filtered by the first and second filters.

2. The inspection device of claim 1 , wherein the first and second filters comprise characteristics wherein a ratio between an amount of scattered light caused by a foreign matter or a defect present on the sample and an amount of scattered light from the surface of the sample is greater than a prescribed threshold value.

3. The inspection device of claim 2 , wherein the first and second filters comprise characteristics wherein a component of light with a ratio between an amount of scattered light caused by a foreign matter or a defect present on the sample and an amount of scattered light from the surface of the sample being less than a prescribed threshold value is blocked.

4. The inspection device of claim 1 , wherein the plurality regions with different polarization characteristics of the second filter have different polarization axes.

5. An inspection device, comprising:

an illumination optical system configured to emit light onto a surface of a sample;

a detection optical system configured to detect scattered light from the sample caused by the illumination optical system;

a first filter disposed at a pupil plane of the detection optical system,

the first filter having a plurality of regions of different transmission characteristics regarding the scattered light;

a second filter disposed near the pupil plane of the detection optical system,

the second filter having a plurality of regions with different polarization characteristics regarding the scattered light; and

a sensor configured to detect scattered light filtered by the first and second filters.

6. An inspection device, comprising:

an illumination optical system configured to emit light onto a surface of a sample;

a detection optical system configured to detect scattered light from the sample caused by the illumination optical system;

a first filter disposed near a pupil plane of the detection optical system,

the first filter having a plurality of regions of different transmission characteristics regarding the scattered light;

a second filter disposed at the pupil plane of the detection optical system,

the second filter having a plurality of regions with different polarization characteristics regarding the scattered light; and

a sensor configured to detect scattered light filtered by the first and second filters.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
Cited By (2)
US 12,524,867 US 12,560,794