IP Library Granted Patent US 10,410,860
Granted Patent B2
US 10,410,860 · App. 15/676,895 · Granted Sep 10, 2019

Transparent nanocrystalline diamond coatings and devices

Inventors: Anirudha V. Sumant (Plainfield, IL); Adam Khan (San Francisco, CA)
Assignee: UChicago Argonne, LLC
H01L21/02527C23C16/274C23C16/511C23C16/56H01L21/0262H01L21/02576H01L21/02579H01L23/3732H01L29/04H01L29/1602H01L29/861
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Quick Facts
Patent No.
US 10,410,860
App. No.
15/676,895
Granted
Sep 10, 2019
Kind
B2
Abstract

A method for coating a substrate comprises producing a plasma ball using a microwave plasma source in the presence of a mixture of gases. The plasma ball has a diameter. The plasma ball is disposed at a first distance from the substrate and the substrate is maintained at a first temperature. The plasma ball is maintained at the first distance from the substrate, and a diamond coating is deposited on the substrate. The diamond coating has a thickness. Furthermore, the diamond coating has an optical transparency of greater than about 80%. The diamond coating can include nanocrystalline diamond. The microwave plasma source can have a frequency of about 915 MHz.

Claims (14)

1. A method for coating a substrate, comprising:

producing a plasma ball using a microwave plasma source in the presence of a mixture of gases, the plasma ball having a diameter;

disposing the plasma ball at a first distance above the substrate such that the plasma ball does not contact the substrate, the substrate maintained at a first temperature of less than 400 degrees Celsius; and

maintaining the plasma ball at the first distance from the substrate for a first time;

depositing a diamond coating on the substrate, the diamond coating having a thickness,

wherein, the diamond coating has an optical transparency of greater than about 80 percent.

2. The method of claim 1 , wherein the diamond coating includes nanocrystalline diamond.

3. The method of claim 1 , wherein the substrate and/or thin film has a thickness less than a thickness threshold, the thickness enabling the substrate to have an optical transparency of greater than 80%.

4. The method of claim 3 , wherein the substrate includes at least one of gallium nitride, aluminum gallium nitride, gallium arsenide, germanium, silicon, silicon nitride and silicon carbide.

5. The method of claim 1 , wherein the microwave plasma source has a frequency of about 915 MHz.

6. The method of claim 1 , wherein the diameter of the plasma ball is the range of about 15 cms to about 30 cms.

7. The method of claim 1 , wherein the first distance is about 0.1 mm to about 5 mm.

8. The method of claim 1 , wherein the first time is about 20 minutes to about 60 minutes.

9. The method of claim 1 , wherein the thickness of the diamond coating is in the range of about 30 nm to about 150 nm.

Assignments (2)
CONFIRMATORY LICENSE Recorded May 17, 2019
From: UCHICAGO ARGONNE, LLC
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 049219/0914 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 7, 2019
From: SUMANT, ANIRUDHA V.
To: UCHICAGO ARGONNE, LLC
Reel/Frame 048271/0171 →
Continuity (2)
Division 14796527 · Jul 10, 2015
Related Publication 20170372896A1 · Dec 28, 2017
Cited By (1)
US 12,325,660