Self-selecting memory cell with dielectric barrier
A self-selecting memory cell may be composed of a memory material that changes threshold voltages based on the polarity of the voltage applied across it. Such a memory cell may be formed at the intersection of a conductive pillar and electrode plane in a memory array. A dielectric material may be formed between the memory material of the memory cell and the corresponding electrode plane. The dielectric material may form a barrier that prevents harmful interactions between the memory material and the material that makes up the electrode plane. In some cases, the dielectric material may also be positioned between the memory material and the conductive pillar to form a second dielectric barrier. The second dielectric barrier may increase the symmetry of the memory array or prevent harmful interactions between the memory material and an electrode cylinder or between the memory material and the conductive pillar.
1. A memory device, comprising:
a stack of planes comprising a first set of planes and a second set of planes;
a conductive pillar disposed through the stack of planes;
a chalcogenide alloy material at least partially surrounding the conductive pillar;
a dielectric material at least partially surrounding the chalcogenide alloy material and separating the chalcogenide alloy material from the first set of planes and the second set of planes;
an electrode material at least partially surrounding the conductive pillar; and
a second dielectric material positioned between the electrode material and the chalcogenide alloy material, wherein the second dielectric material at least partially surrounds the electrode material and the chalcogenide alloy material at least partially surrounds the second dielectric material.
2. The memory device of claim 1 , wherein the chalcogenide alloy material is in contact with the electrode material.
3. A memory device, comprising:
a stack of planes comprising a first set of planes and a second set of planes;
a conductive pillar disposed through the stack of planes;
a chalcogenide alloy material at least partially surrounding the conductive pillar;
a dielectric material at least partially surrounding the chalcogenide alloy material; and
a second dielectric material positioned between the conductive pillar and the chalcogenide alloy material, wherein the second dielectric material at least partially surrounds the conductive pillar.
4. The memory device of claim 1 , wherein the first set of planes comprises a first material and the second set of planes comprises a second material different than the first material.
5. The memory device of claim 4 , wherein the first material comprises a conductive material and the second material comprises a dielectric material.
6. The memory device of claim 4 , wherein the first set of planes is interleaved with the second set of planes.
7. The memory device of claim 1 , wherein the dielectric material is in contact with the first set of planes and the second set of planes.
8. A memory device, comprising:
a memory stack comprising a first conductive plane and a second plane;
a dielectric barrier disposed through and in contact with the first conductive plane and the second plane, wherein the first conductive plane and the second plane comprise horizontal planes and the dielectric barrier is disposed vertically through the first conductive plane and the second plane; and
a chalcogenide alloy material in contact with the dielectric barrier and separated from the first conductive plane and the second plane by the dielectric barrier.
9. The memory device of claim 8 , further comprising:
an electrode material in contact with the chalcogenide alloy material; and
a conductive pillar in contact with the electrode material.
10. The memory device of claim 9 , wherein the dielectric barrier, the chalcogenide alloy material, and the electrode material comprise concentric cylinders.
11. A memory device, comprising:
a memory stack comprising a first conductive plane and a second plane;
a dielectric barrier disposed through and in contact with the first conductive plane and the second plane;
a chalcogenide alloy material in contact with the dielectric barrier; and
a second dielectric barrier in contact with the chalcogenide alloy material.
12. The memory device of claim 11 , further comprising:
a conductive pillar in contact with the second dielectric barrier.
13. The memory device of claim 11 , further comprising:
an electrode material in contact with the second dielectric barrier; and
a conductive pillar in contact with the electrode material.
14. The memory device of claim 8 , wherein the second plane comprises a dielectric material.
15. The memory device of claim 8 , wherein the first conductive plane is in contact with a top side of the second plane, the memory device further comprising:
a second conductive plane in contact with a bottom side of the second plane.
16. The memory device of claim 3 , wherein the first set of planes comprises a first material and the second set of planes comprises a second material different than the first material.
17. The memory device of claim 16 , wherein the first material comprises a conductive material and the second material comprises a dielectric material.
18. The memory device of claim 16 , wherein the first set of planes is interleaved with the second set of planes.
19. The memory device of claim 3 , wherein the dielectric material is in contact with the first set of planes and the second set of planes.
20. The memory device of claim 3 , wherein the dielectric material, the chalcogenide alloy material, and the second dielectric material comprise concentric cylinders.
21. The memory device of claim 20 , wherein the dielectric material, the chalcogenide alloy material, and the second dielectric material comprise a symmetric memory column.
22. The memory device of claim 3 , wherein the first set of planes and the second set of planes comprise horizontal planes and the dielectric material and the second dielectric material are disposed vertically through the first set of planes and the second set of planes.
23. The memory device of claim 3 , wherein a first plane of the first set of planes is in contact with a top side of a first plane of the second set of planes, the memory device further comprising:
a second plane of the first set of planes in contact with a bottom side of the first plane of the second set of planes.
24. The memory device of claim 3 , further comprising:
an electrode material at least partially surrounding the conductive pillar, the electrode material in contact with the second dielectric material; and
the conductive pillar in contact with the electrode material.
25. The memory device of claim 3 , further comprising:
the dielectric material in contact with the chalcogenide alloy material; and
the second dielectric material in contact with the chalcogenide alloy material.
26. The memory device of claim 3 , wherein the chalcogenide alloy material is positioned between the dielectric material and the second dielectric material.
27. The memory device of claim 3 , wherein the dielectric material and the second dielectric material comprise the same material or different materials.