PLASMA ANTENNA AND APPARATUS FOR GENERATING PLASMA HAVING THE SAME

1 . A plasma antenna comprising:

a first antenna inducing electromagnetic fields by using an RF signal;

a second antenna inducing electromagnetic fields by using the RF signal; and

a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna,

wherein the first antenna comprises a first RF feed receiving the RF signal and having a pillar shape and a first coil connected to the first RF feed, and

the second antenna comprises a second RF feed receiving the RF signal and having a hollow pillar shape surrounding the first RF feed and a second coil connected to the second RF feed,

wherein the capacitor comprises:

a first conductor having a pillar shape, the first conductor being coaxially disposed with respect to the first RF feed;

a second conductor has a hollow pillar shape surrounding the first conductor, the second conductor being coaxially disposed with respect to the second RF feed,

wherein the capacitor is attachable to at least one of the first and second antennas.

2 . The plasma antenna of claim 1 , wherein the first RF feed has a cylindrical shape, and

the second RF feed has a hollow cylindrical shape surrounding the cylindrical shape.

3 . The plasma antenna of claim 1 , wherein the first and second RF feeds are coaxially disposed with respect to each other.

4 . The plasma antenna of claim 1 , wherein the dielectric comprises a polymer or metal oxide.

5 . The plasma antenna of claim 4 , wherein the polymer comprises Teflon, ULTEM, or polyetheretherketone (PEEK).

6 . The plasma antenna of claim 4 , wherein the metal oxide comprises ceramic.

7 . The plasma antenna of claim 6 , wherein the ceramic comprises Al 2 O 3 or ZnO.

8 . A plasma generating apparatus comprising:

an RF power source providing an RF signal;

a plasma chamber in which a gas is injected to generate plasma; and

a plasma antenna disposed on the plasma chamber, the plasma receiving the RF signal to induce electromagnetic fields in the plasma chamber,

wherein the plasma antenna comprises:

a first antenna inducing electromagnetic fields by using the RF signal;

a second antenna inducing electromagnetic fields by using the RF signal; and

a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna,

wherein the first antenna comprises a first RF feed receiving the RF signal and having a pillar shape and a first coil connected to the first RF feed, and

the second antenna comprises a second RF feed receiving the RF signal and having a hollow pillar shape surrounding the first RF feed and a second coil connected to the second RF feed,

wherein the capacitor comprises:

a first conductor having a pillar shape, the first conductor being coaxially disposed with respect to the first RF feed;

a second conductor has a hollow pillar shape surrounding the first conductor, the second conductor being coaxially disposed with respect to the second RF feed,

wherein the capacitor is attachable to at least one of the first and second antennas.

9 . The plasma generating apparatus of claim 8 , wherein the plasma antenna is on an upper portion of the plasma chamber.

10 . The plasma generating apparatus of claim 8 , wherein the first and second antennas are inductively coupled to each other.

11 . The plasma generating apparatus of claim 8 , wherein the first and second antennas are connected to each other in parallel.

12 . The plasma generating apparatus of claim 8 , wherein the dielectric comprises a polymer or metal oxide.

13 . The plasma generating apparatus of claim 12 , wherein the polymer comprises Teflon, ULTEM, or polyetheretherketone (PEEK).

14 . The plasma generating apparatus of claim 12 , wherein the metal oxide comprises ceramic.

15 . The plasma generating apparatus of claim 14 , wherein the ceramic comprises Al 2 O 3 or ZnO.