Utilizing multiple layers to increase spatial frequency
A chemical material is deposited on a surface of a substrate. A mandrel composition is deposited on a surface of the chemical material. A mandrel hard mask pattern is deposited on a surface of the mandrel composition. The mandrel composition is etched. The mandrel hard mask pattern is removed. A plurality of spacer materials are deposited sequentially onto a surface of the chemical material and a surface of the mandrel composition. A portion of each of the plurality of spacer materials are removed sequentially. A remainder of the mandrel composition is removed. The substrate is etched. The chemical material and at least one of the spacer materials of the plurality of spacer materials are removed.
1. A method, comprising:
depositing a chemical material on a surface of a substrate;
depositing a mandrel composition on a surface of the chemical material;
depositing, without any intervening etching, a mandrel hard mask pattern on a surface of the mandrel composition;
etching the mandrel composition;
removing the mandrel hard mask pattern;
depositing a first spacer material on a surface of the chemical material and a surface of the mandrel composition;
removing a portion of the first spacer material;
depositing a second spacer material on a surface of the first spacer material, a surface of the chemical material, and a surface of the mandrel composition;
removing a portion of the second spacer material;
depositing a third spacer material on a surface of the second spacer material, a surface of the first spacer material, a surface of the chemical material, and a surface of the mandrel composition;
removing, sequentially, and after depositing the third spacer material, a portion of the third spacer material, a remainder of the second spacer material, and a remainder of the mandrel composition;
etching the substrate; and
removing all of the chemical material, the first spacer material, and the third spacer material.
2. The method of claim 1 , wherein the first spacer material and the third spacer material are a same type of material.
3. The method of claim 1 , wherein the first spacer material and the third spacer material are different types of material.
4. The method of claim 1 , wherein the first spacer material, the second spacer material, and the third spacer material are deposited in different amounts, and wherein the depositing the mandrel hard mask pattern on the surface of the mandrel composition is such that mandrel hard mask pattern is substantially equidistant.
5. The method of claim 1 , further comprising:
depositing a fourth spacer material on a surface of the third spacer material, a surface of the second spacer material, a surface of the first spacer material, a surface of the chemical material, and a surface of the mandrel composition;
removing a portion of the fourth spacer material;
depositing a fifth spacer material on a surface of the third spacer material, a surface of the second spacer material, a surface of the first spacer material, a surface of the chemical material, and a surface of the mandrel composition;
removing a portion of the fifth spacer material; and
removing a remainder of the fourth spacer material and a remainder of the fifth spacer material, and wherein the first spacer material, the second spacer material, the third spacer material, the fourth spacer material, and the fifth spacer material are all different types of materials.