Vacuum processing apparatus
A vacuum processing apparatus includes a vacuum processing chamber, an upper electrode, a lower electrode, a first high-frequency power source, a second high-frequency power source, a first matching box, a second matching box, a copper plate for connecting an electrode shaft of the lower electrode with the second matching box, a drive base on which the electrode shaft of the lower electrode and the second matching box are mounted, a drive unit for ascending or descending the drive base, and an exhaust unit disposed at a position equally distanced from an exhaust outlet by a distance.
1. A vacuum processing apparatus, comprising:
a first processing unit including:
a first vacuum processing chamber having a first exhaust outlet,
a first upper electrode disposed over the first vacuum processing chamber and grounded,
a first lower electrode disposed in a lower portion of the first vacuum processing chamber and capable of ascending and descending,
a first high-frequency power source configured to supply first high-frequency power having a first high frequency to the first lower electrode,
a second high-frequency power source configured to supply second high-frequency power having a second high frequency which is higher than the first high frequency to the first lower electrode,
a first matching box connected to the first high-frequency power source,
a second matching box connected to the first matching box and the second high-frequency power source, and
a first copper plate connecting a first electrode shaft of the first lower electrode with the second matching box;
a second processing unit having a shape and measurements substantially identical to the shape and measurements of the first processing unit, and including:
a second vacuum processing chamber having a second exhaust outlet,
a second upper electrode disposed over the second vacuum processing chamber and grounded,
a second lower electrode disposed in a lower portion of the second vacuum processing unit and capable of ascending and descending,
a third high-frequency power source configured to supply the first high-frequency power having the first high frequency to the second lower electrode,
a fourth high-frequency power source configured to supply the second high-frequency power having the second high frequency which is higher than the first high frequency to the second lower electrode,
a third matching box connected to the third high-frequency power source,
a fourth matching box connected to the third matching box and the fourth high-frequency power source, and
a second copper plate connecting a second electrode shaft of the second lower electrode with the fourth matching box;
a drive base on which the first electrode shaft and the second electrode shaft are mounted, and each of the second matching box and the fourth matching box are respectively fixed at positions distanced from each of the first electrode shaft and the second electrode shaft, wherein a distance between the second matching box and the first electrode shaft and a distance between the fourth matching box and the second electrode shaft are equal;
a drive unit configured to ascending and descending the drive base; and
an exhaust unit disposed at a position equally distanced from the first exhaust outlet and the second exhaust outlet.
2. The vacuum processing apparatus according to claim 1 , wherein
the first matching box is disposed over the first upper electrode, and
the third matching box is disposed over the second upper electrode.
3. The vacuum processing apparatus according to claim 1 , wherein
a drive shaft of the drive unit is disposed in a center portion of the drive base, and
the second matching box and the fourth matching box are disposed on both ends of the drive base at positions equally distanced from the center portion of the drive base.
4. The vacuum processing apparatus according to claim 3 , wherein
the second matching box and the fourth matching box are suspended from the drive base.
5. The vacuum processing apparatus according to claim 3 , wherein
the exhaust unit is disposed between the second matching box and the fourth matching box.
6. The vacuum processing apparatus according to claim 1 , further comprising:
a gas feeder configured to feed a gas to the first vacuum processing chamber and the second vacuum processing chamber, wherein
a gas pipe connected to the gas feeder is branched off at a position equally distanced to the first vacuum processing chamber and the second vacuum processing chamber.
7. The vacuum processing apparatus according to claim 1 , wherein
the second matching box and the fourth matching box each include both a first high-frequency cut filter for cutting the first high frequency to the second and fourth high-frequency power sources and a second high-frequency cut filter for cutting the second high frequency to the first and third high-frequency power sources.
8. The vacuum processing apparatus according to claim 7 , wherein
the second high-frequency cut filter included in the second matching box and the fourth matching box is disposed near a connection terminal of the second matching box connected to the first matching box and near a connection terminal of the fourth matching box connected to the third matching box.
9. The vacuum processing apparatus according to claim 7 , wherein
the first and second matching boxes are connected by a coaxial cable, and the third and fourth matching boxes are connected by a coaxial cable.
10. The vacuum processing apparatus according to claim 1 , wherein
the first matching box and the third matching box are each connected to a direct current power source, and
the first matching box supplies direct current power to the first lower electrode via the second matching box, and the third matching box supplies direct current power to the second lower electrode via the fourth matching box.
11. The vacuum processing apparatus according to claim 1 , wherein
the first copper plate and the second copper plate both are wide in a height direction.
12. The vacuum processing apparatus according to claim 1 , wherein
the first copper plate is disposed in a first box with an insulation distance of at least 20 mm between the first box and the first copper plate, and
the second copper plate is disposed in a second box with an insulation distance of at least 20 mm between the second box and the second copper plate.
13. A vacuum processing apparatus comprising:
a load port on which a cassette storing a sample is mounted,
an atmospheric transfer chamber connected to the load port and including an atmospheric transfer robot,
a loadlock chamber connected to the atmospheric transfer chamber,
a vacuum transfer chamber connected to the loadlock chamber and including a vacuum transfer robot, and
a plurality of vacuum processing units including a first vacuum processing unit connected to the vacuum transfer chamber,
the first vacuum processing unit comprising:
a first processing unit including:
a first vacuum processing chamber having a first exhaust outlet,
a first upper electrode disposed over the first vacuum processing chamber and grounded,
a first lower electrode disposed in a lower portion of the first vacuum processing chamber and capable of ascending and descending,
a first high-frequency power source configured to supply first high-frequency power having a first high frequency to the first lower electrode,
a second high-frequency power source configured to supply second high-frequency power having a second high-frequency which is higher than the first high frequency to the first lower electrode,
a first matching box connected to the first high-frequency power source,
a second matching box connected to the first matching box and the second high-frequency power source, and
a first copper plate connecting a first electrode shaft of the first lower electrode with the second matching box;
a second processing unit having a shape and measurements substantially identical to the shape and measurements of the first processing unit, and including:
a second vacuum processing chamber having a second exhaust outlet,
a second upper electrode disposed over the second vacuum processing chamber and grounded,
a second lower electrode disposed in a lower portion of the second vacuum processing unit and capable of ascending and descending,
a third high-frequency power source configured to supply the first high-frequency power having the first high frequency to the second lower electrode,
a fourth high-frequency power source configured to supply the second high-frequency power having the second high frequency which is higher than the first high frequency to the second lower electrode,
a third matching box connected to the third high-frequency power source,
a fourth matching box connected to the third matching box and the fourth high-frequency power source, and
a second copper plate connecting a second electrode shaft of the second lower electrode with the fourth matching box;
a drive base on which the first electrode shaft and the second electrode shaft are mounted, and each of the second matching box and the fourth matching box are respectively fixed at positions distanced from each of the first electrode shaft and the second electrode shaft, wherein a distance between the second matching box and the first electrode shaft and a distance between the fourth matching box and the second electrode shaft are equal;
a drive unit configured to ascend and descend the drive base; and
an exhaust unit disposed at a position equally distanced from the first exhaust outlet and the second exhaust outlet.